Recent trends of moderate-pressure microwave plasma-enhanced CVD from diamond to nanocarbons

Research output: Contribution to journalReview article

Abstract

Recent trends of CVD techniques by using moderate-pressure microwave plasmas are reviewed. Microwave plasma sources generate stable and high-density plasmas typically at pressures of 10 to 100 Torr. They have been developed exclusively to deposit artificial diamond films and are increasingly used to deposit nanostructured carbon materials. The deposition mechanism and electrical properties of nanocrystalline diamond films and carbon nanowalls are described.

Original languageEnglish
Pages (from-to)11-15
Number of pages5
JournalIEEJ Transactions on Fundamentals and Materials
Volume131
Issue number1
DOIs
Publication statusPublished - Feb 28 2011

Fingerprint

Diamond films
Plasma enhanced chemical vapor deposition
Diamonds
Deposits
Microwaves
Carbon
Plasma sources
Plasma density
Chemical vapor deposition
Electric properties
Plasmas

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering

Cite this

Recent trends of moderate-pressure microwave plasma-enhanced CVD from diamond to nanocarbons. / Tsutsui, Kungen.

In: IEEJ Transactions on Fundamentals and Materials, Vol. 131, No. 1, 28.02.2011, p. 11-15.

Research output: Contribution to journalReview article

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