Redox characteristics of amino acids using low pressure water vapor RF plasma

Yusuke Akiyoshi, Akari Nakahigashi, Nobuya Hayashi, Satoshi Kitazaki, Takuro Iwao, Kazunori Koga, Masaharu Shiratani

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)


The redox reaction between cystein and cystine is studied using water vapor plasma produced by the RF discharge concerning the growth control of plants. The stress reaction of plants has been achieved, when the water vapor plasma is irradiated to the seeds or stem, leaf of plants such as radish sprout. The mechanism of the growth control is investigated by analyzing amino acids of cystein and cystine. The water vapor plasma can oxidize and reduce the cystein and cystine, respectively by choosing the plasma parameters. The redox reaction of cystein and cystine in thioredoxin would be the mechanism of the plant control.

Original languageEnglish
Title of host publicationTENCON 2010 - 2010 IEEE Region 10 Conference
Number of pages3
Publication statusPublished - 2010
Event2010 IEEE Region 10 Conference, TENCON 2010 - Fukuoka, Japan
Duration: Nov 21 2010Nov 24 2010

Publication series

NameIEEE Region 10 Annual International Conference, Proceedings/TENCON


Other2010 IEEE Region 10 Conference, TENCON 2010

All Science Journal Classification (ASJC) codes

  • Computer Science Applications
  • Electrical and Electronic Engineering


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