Redox characteristics of amino acids using low pressure water vapor RF plasma

Yusuke Akiyoshi; Akari Nakahigashi; Nobuya Hayashi; Satoshi Kitazaki; Takuro Iwao; Kazunori Koga; Masaharu Shiratani

doi:10.1109/TENCON.2010.5686467

Redox characteristics of amino acids using low pressure water vapor RF plasma

Yusuke Akiyoshi, Akari Nakahigashi, Nobuya Hayashi, Satoshi Kitazaki, Takuro Iwao, Kazunori Koga, Masaharu Shiratani

Electronic Devices

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

5 Citations (Scopus)

Abstract

The redox reaction between cystein and cystine is studied using water vapor plasma produced by the RF discharge concerning the growth control of plants. The stress reaction of plants has been achieved, when the water vapor plasma is irradiated to the seeds or stem, leaf of plants such as radish sprout. The mechanism of the growth control is investigated by analyzing amino acids of cystein and cystine. The water vapor plasma can oxidize and reduce the cystein and cystine, respectively by choosing the plasma parameters. The redox reaction of cystein and cystine in thioredoxin would be the mechanism of the plant control.

Original language	English
Title of host publication	TENCON 2010 - 2010 IEEE Region 10 Conference
Pages	1957-1959
Number of pages	3
DOIs	https://doi.org/10.1109/TENCON.2010.5686467
Publication status	Published - 2010
Event	2010 IEEE Region 10 Conference, TENCON 2010 - Fukuoka, Japan Duration: Nov 21 2010 → Nov 24 2010

Publication series

Name	IEEE Region 10 Annual International Conference, Proceedings/TENCON

Other

Other	2010 IEEE Region 10 Conference, TENCON 2010
Country/Territory	Japan
City	Fukuoka
Period	11/21/10 → 11/24/10

All Science Journal Classification (ASJC) codes

Computer Science Applications
Electrical and Electronic Engineering

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10.1109/TENCON.2010.5686467

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Redox characteristics of amino acids using low pressure water vapor RF plasma. / Akiyoshi, Yusuke; Nakahigashi, Akari; Hayashi, Nobuya et al.

TENCON 2010 - 2010 IEEE Region 10 Conference. 2010. p. 1957-1959 5686467 (IEEE Region 10 Annual International Conference, Proceedings/TENCON).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Akiyoshi, Y, Nakahigashi, A, Hayashi, N, Kitazaki, S, Iwao, T, Koga, K & Shiratani, M 2010, Redox characteristics of amino acids using low pressure water vapor RF plasma. in TENCON 2010 - 2010 IEEE Region 10 Conference., 5686467, IEEE Region 10 Annual International Conference, Proceedings/TENCON, pp. 1957-1959, 2010 IEEE Region 10 Conference, TENCON 2010, Fukuoka, Japan, 11/21/10. https://doi.org/10.1109/TENCON.2010.5686467

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abstract = "The redox reaction between cystein and cystine is studied using water vapor plasma produced by the RF discharge concerning the growth control of plants. The stress reaction of plants has been achieved, when the water vapor plasma is irradiated to the seeds or stem, leaf of plants such as radish sprout. The mechanism of the growth control is investigated by analyzing amino acids of cystein and cystine. The water vapor plasma can oxidize and reduce the cystein and cystine, respectively by choosing the plasma parameters. The redox reaction of cystein and cystine in thioredoxin would be the mechanism of the plant control.",

author = "Yusuke Akiyoshi and Akari Nakahigashi and Nobuya Hayashi and Satoshi Kitazaki and Takuro Iwao and Kazunori Koga and Masaharu Shiratani",

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AU - Akiyoshi, Yusuke

AU - Nakahigashi, Akari

AU - Hayashi, Nobuya

AU - Kitazaki, Satoshi

AU - Iwao, Takuro

AU - Koga, Kazunori

AU - Shiratani, Masaharu

PY - 2010

Y1 - 2010

N2 - The redox reaction between cystein and cystine is studied using water vapor plasma produced by the RF discharge concerning the growth control of plants. The stress reaction of plants has been achieved, when the water vapor plasma is irradiated to the seeds or stem, leaf of plants such as radish sprout. The mechanism of the growth control is investigated by analyzing amino acids of cystein and cystine. The water vapor plasma can oxidize and reduce the cystein and cystine, respectively by choosing the plasma parameters. The redox reaction of cystein and cystine in thioredoxin would be the mechanism of the plant control.

AB - The redox reaction between cystein and cystine is studied using water vapor plasma produced by the RF discharge concerning the growth control of plants. The stress reaction of plants has been achieved, when the water vapor plasma is irradiated to the seeds or stem, leaf of plants such as radish sprout. The mechanism of the growth control is investigated by analyzing amino acids of cystein and cystine. The water vapor plasma can oxidize and reduce the cystein and cystine, respectively by choosing the plasma parameters. The redox reaction of cystein and cystine in thioredoxin would be the mechanism of the plant control.

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SN - 9781424468904

T3 - IEEE Region 10 Annual International Conference, Proceedings/TENCON

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BT - TENCON 2010 - 2010 IEEE Region 10 Conference

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Y2 - 21 November 2010 through 24 November 2010

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Redox characteristics of amino acids using low pressure water vapor RF plasma

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