Redox characteristics of thiol compounds using radicals produced by water vapor radio frequency discharge

Nobuya Hayashi, Akari Nakahigashi, Masaaki Goto, Satoshi Kitazaki, Kazunori Koga, Masaharu Shiratani

Research output: Contribution to journalArticlepeer-review

16 Citations (Scopus)

Abstract

The redox reaction between cystein and cystine is observed using radicals produced in water vapor plasma for the control of plant growth. Cystein is oxidized to cystine using the OH radical in the higher-pressure regime and cystine is reduced to cystein by the H radical generated in the lowerpressure regime. Also, the oxidative stress reaction of plants is observed when water vapor plasma is irradiated onto seeds of plants such as radish sprouts. The mechanism of the control of plant growth is explained by the change in thiol compound quantity of the plant cells induced by the radical reaction.

Original languageEnglish
Article number08JF04
JournalJapanese journal of applied physics
Volume50
Issue number8 PART 2
DOIs
Publication statusPublished - Aug 2011

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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