Reflective optics for sub-10nm hard X-ray focusing

H. Mimura, S. Matsuyama, H. Yumoto, S. Handa, Takashi Kimura, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi

Research output: Contribution to journalConference articlepeer-review

5 Citations (Scopus)

Abstract

Nanofocused X-rays are indispensable because they can provide high spatial resolution and high sensitivity for X-ray nanoscopy/spectroscopy. A focusing system with reflective optics is one of the most promising methods for producing nanofocused X-rays due to its high efficiency and beams size. So, far we realize efficient hard X-ray focusing with a beam size of 25nm. Our next project is realization of sub-10nm hard X-ray focusing. Here, we describe the design of the graded multilayer mirror and evaluation method for hard X-ray focused beam.

Original languageEnglish
Article number67050L
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume6705
DOIs
Publication statusPublished - Dec 1 2007
Externally publishedYes
EventAdvances in X-Ray/EUV Optics and Components II - San Diego, CA, United States
Duration: Aug 27 2007Aug 28 2007

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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