Abstract
Nanofocused X-rays are indispensable because they can provide high spatial resolution and high sensitivity for X-ray nanoscopy/spectroscopy. A focusing system with reflective optics is one of the most promising methods for producing nanofocused X-rays due to its high efficiency and beams size. So, far we realize efficient hard X-ray focusing with a beam size of 25nm. Our next project is realization of sub-10nm hard X-ray focusing. Here, we describe the design of the graded multilayer mirror and evaluation method for hard X-ray focused beam.
Original language | English |
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Article number | 67050L |
Journal | Proceedings of SPIE - The International Society for Optical Engineering |
Volume | 6705 |
DOIs | |
Publication status | Published - Dec 1 2007 |
Externally published | Yes |
Event | Advances in X-Ray/EUV Optics and Components II - San Diego, CA, United States Duration: Aug 27 2007 → Aug 28 2007 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering