Refractive index change in Al+-ion-implanted silica glass

Kohei Fukumi, Akiyoshi Chayahara, Naoyuki Kitamura, Junji Nishii, Kohei Kadono, Masaki Makihara, Kanenaga Fujii, Junji Hayakawa

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

Al+ ions have been implanted in silica glass at an acceleration energy of 200 eV and doses ranging from 1×10 13 to 1×10 17 ions cm -2. Infrared reflection spectra and ultraviolet, visible, and near-infrared absorption spectra have been measured. It was found that refractive index of silica glass increased by 6%-10% after implantation of 1×10 17 Al + ions cm -2. It was deduced that this refractive index change is caused by the formation of Si-Si homobonds. but not by the decrease in Si-O-Si bond angle which leads to compaction.

Original languageEnglish
Pages (from-to)1060-1064
Number of pages5
JournalJournal of Applied Physics
Volume79
Issue number2
DOIs
Publication statusPublished - Jan 15 1996

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silica glass
refractivity
ions
infrared reflection
infrared absorption
implantation
infrared spectra
absorption spectra
dosage
energy

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

Fukumi, K., Chayahara, A., Kitamura, N., Nishii, J., Kadono, K., Makihara, M., ... Hayakawa, J. (1996). Refractive index change in Al+-ion-implanted silica glass. Journal of Applied Physics, 79(2), 1060-1064. https://doi.org/10.1063/1.360894

Refractive index change in Al+-ion-implanted silica glass. / Fukumi, Kohei; Chayahara, Akiyoshi; Kitamura, Naoyuki; Nishii, Junji; Kadono, Kohei; Makihara, Masaki; Fujii, Kanenaga; Hayakawa, Junji.

In: Journal of Applied Physics, Vol. 79, No. 2, 15.01.1996, p. 1060-1064.

Research output: Contribution to journalArticle

Fukumi, K, Chayahara, A, Kitamura, N, Nishii, J, Kadono, K, Makihara, M, Fujii, K & Hayakawa, J 1996, 'Refractive index change in Al+-ion-implanted silica glass', Journal of Applied Physics, vol. 79, no. 2, pp. 1060-1064. https://doi.org/10.1063/1.360894
Fukumi K, Chayahara A, Kitamura N, Nishii J, Kadono K, Makihara M et al. Refractive index change in Al+-ion-implanted silica glass. Journal of Applied Physics. 1996 Jan 15;79(2):1060-1064. https://doi.org/10.1063/1.360894
Fukumi, Kohei ; Chayahara, Akiyoshi ; Kitamura, Naoyuki ; Nishii, Junji ; Kadono, Kohei ; Makihara, Masaki ; Fujii, Kanenaga ; Hayakawa, Junji. / Refractive index change in Al+-ion-implanted silica glass. In: Journal of Applied Physics. 1996 ; Vol. 79, No. 2. pp. 1060-1064.
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