Relation between the adhesion strength and interfacial width for symmetric polystyrene bilayers

Kei Ichi Akabori, Daisuke Baba, Kazuhiro Koguchi, Keiji Tanaka, Toshihiko Nagamura

Research output: Contribution to journalArticle

19 Citations (Scopus)

Abstract

Polystyrene (PS) bilayers were prepared and were adhered at a temperature between the surface and bulk glass-transition temperatures for a given time. Then, the interfacial adhesion strength (GL) was examined with a conventional lapshear measurement. GL first increased with increasing adhesion time and then reached a constant value. This result implied that the segments moved across the interface, to a certain depth, even at a temperature below the bulk glass-transition temperature. To confirm this, the interfacial evolution for the PS/deuterated PS bilayers was examined with dynamic secondary-ion mass spectrometry. The GL value was linearly proportional to the thickness of the interfacial adhesion layer. Finally, we propose a strategy for regulating the adhesion strength based on the chain-end chemistry.

Original languageEnglish
Pages (from-to)3598-3604
Number of pages7
JournalJournal of Polymer Science, Part B: Polymer Physics
Volume44
Issue number24
DOIs
Publication statusPublished - Dec 15 2006

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Polystyrenes
Bond strength (materials)
polystyrene
adhesion
Adhesion
glass transition temperature
Secondary ion mass spectrometry
secondary ion mass spectrometry
Temperature
chemistry
temperature
Glass transition temperature

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Physical and Theoretical Chemistry
  • Polymers and Plastics
  • Materials Chemistry

Cite this

Relation between the adhesion strength and interfacial width for symmetric polystyrene bilayers. / Akabori, Kei Ichi; Baba, Daisuke; Koguchi, Kazuhiro; Tanaka, Keiji; Nagamura, Toshihiko.

In: Journal of Polymer Science, Part B: Polymer Physics, Vol. 44, No. 24, 15.12.2006, p. 3598-3604.

Research output: Contribution to journalArticle

Akabori, Kei Ichi ; Baba, Daisuke ; Koguchi, Kazuhiro ; Tanaka, Keiji ; Nagamura, Toshihiko. / Relation between the adhesion strength and interfacial width for symmetric polystyrene bilayers. In: Journal of Polymer Science, Part B: Polymer Physics. 2006 ; Vol. 44, No. 24. pp. 3598-3604.
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