Relationship between film thickness and chain structure of ultrathin polyurethane films

Yoshitaka Mitsui, Yusuke Uchiba, Suguru Motokucho, Ken Kojio, Mutsuhisa Furukawa

Research output: Contribution to conferencePaperpeer-review

Abstract

Polyurethanes (PUs) with three hard segment contents (20, 34 and 45 wt%) were synthesized with poly(oxytetramethylene) glycol (PTMG), 4,4′-diphenylmethane diisocyanate (MDI) and 1,4-butanediol (BD) by a prepolymer method. PU thin and ultrathin films were prepared onto a hydrophilic silicon wafer by a spin coating method. The change in microphase separation of PU thin and ultrathin films was investigated by Fourier transform infrared (FTIR) spectroscopy, X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM) and grazing incidence small angle x-ray scattering (GISAXS) measurement as a function of film thickness. Microphase-separated structure was clearly observed for all PU films, in which the hard segment domains were surrounded by the soft segment matrix. With decreasing film thickness, interdomain spacing between hard segment domains decreased. This seems to be simply related to a decreasing space. For the first time, we successfully obtained the experimental data, which the phase-separated domain size decreased with decreasing film thickness.

Original languageEnglish
Pages3371-3372
Number of pages2
Publication statusPublished - Dec 1 2006
Externally publishedYes
Event55th Society of Polymer Science Japan Symposium on Macromolecules - Toyama, Japan
Duration: Sep 20 2006Sep 22 2006

Other

Other55th Society of Polymer Science Japan Symposium on Macromolecules
CountryJapan
CityToyama
Period9/20/069/22/06

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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