TY - JOUR
T1 - Relationship between the locations of activated dislocations and the cooling flux direction in monocrystalline-like silicon grown in the [001] and [111] directions
AU - Gao, Bing
AU - Kakimoto, Koichi
PY - 2013/12
Y1 - 2013/12
N2 - To effectively control dislocations of monocrystalline-like silicon grown in the [001] and [111] directions, the relationship between the locations of activated dislocations and the cooling flux direction was studied numerically from the perspective of activation of slip systems. The cooling flux direction was shown to have a significant effect on the activation of slip systems. The radial flux and axial flux activate different slip systems at different locations in the crystal. The relationship between the flux direction and the activation of slip systems in the [001] and [111] growth directions has been revealed. The results provide theoretical support for reducing dislocations inside a crystal or in the part of the crystal where dislocations can cause the most damage, by intentionally controlling the flux direction during the crystal growth process.
AB - To effectively control dislocations of monocrystalline-like silicon grown in the [001] and [111] directions, the relationship between the locations of activated dislocations and the cooling flux direction was studied numerically from the perspective of activation of slip systems. The cooling flux direction was shown to have a significant effect on the activation of slip systems. The radial flux and axial flux activate different slip systems at different locations in the crystal. The relationship between the flux direction and the activation of slip systems in the [001] and [111] growth directions has been revealed. The results provide theoretical support for reducing dislocations inside a crystal or in the part of the crystal where dislocations can cause the most damage, by intentionally controlling the flux direction during the crystal growth process.
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U2 - 10.1107/S002188981302517X
DO - 10.1107/S002188981302517X
M3 - Article
AN - SCOPUS:84887961105
SN - 0021-8898
VL - 46
SP - 1771
EP - 1780
JO - Journal of Applied Crystallography
JF - Journal of Applied Crystallography
IS - 6
ER -