Relationships between hard segment content and phase separated structure of polyurethane ultrathin films

Yusuke Uchiba, Ken Kojio, Mutsuhisa Furukawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Polyurethane ultrathin films with two hard segment contents (20 and 45 wt%) were prepared onto a silicon wafer by a spin coating method. The change in the microphase separation of the polyurethane ultrathin films was investigated by atomic force microscope (AFM) and Fourier transform infrared (FT-IR) spectroscopy as a function of film thickness. For the thick film, the domain size was ca. 20 nm, which is almost the same as bulk one. On the other hand, the size of hard segment domains for the ultrathin films decreased with decrease in film thickness. The domain size was ca. 10 nm for the ultrathin film. This seems to be simply related to a decreasing space.

Original languageEnglish
Title of host publication54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan
Pages1088
Number of pages1
Volume54
Edition1
Publication statusPublished - 2005
Externally publishedYes
Event54th SPSJ Annual Meeting 2005 - Yokohama, Japan
Duration: May 25 2005May 27 2005

Other

Other54th SPSJ Annual Meeting 2005
CountryJapan
CityYokohama
Period5/25/055/27/05

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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