Removal of thin layer for trace element analysis of solid surface in subnanometer scale using laser-ablation atomic fluorescence spectroscopy

Yuji Oki, Kenji Matsunaga, Takumi Nomura, Mitsuo Maeda

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

Laser-ablation atomic fluorescence (LAAF) spectroscopy has extremely high sensitivity in the analysis of trace elements. Using the ArF laser-ablation technique at a wavelength of 193 nm, removal of thin surface layer of the order of 1.1 nm/shot for the first 50 shots and 0.4 nm/shot after that is demonstrated for a solid glass sample. A constant fluorescence signal from Na atoms is obtained for each shot. There is a possibility of determining the depth distribution of an element with subnanometer resolution by applying LAAF spectroscopy.

Original languageEnglish
Pages (from-to)2916-2918
Number of pages3
JournalApplied Physics Letters
Volume71
Issue number20
DOIs
Publication statusPublished - Nov 17 1997

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trace elements
solid surfaces
laser ablation
shot
fluorescence
spectroscopy
surface layers
glass
sensitivity
wavelengths
atoms

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Cite this

Removal of thin layer for trace element analysis of solid surface in subnanometer scale using laser-ablation atomic fluorescence spectroscopy. / Oki, Yuji; Matsunaga, Kenji; Nomura, Takumi; Maeda, Mitsuo.

In: Applied Physics Letters, Vol. 71, No. 20, 17.11.1997, p. 2916-2918.

Research output: Contribution to journalArticle

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