Removing focused ion-beam damages on transmission electron microscopy specimens by using a plasma cleaner

Satoshi Hata, Harini Sosiati, Noriyuki Kuwano, Masaru Itakura, Takayoshi Nakano, Yukichi Umakoshi

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

Abstract

A plasma cleaner is usually used for removing carbonaceous debris from a specimen and preventing contamination during transmission electron microscopy (TEM) imaging and analysis. However, the plasma cleaner can be effectively used for thinning down damage layers on TEM specimens prepared by focused ion-beam (FIB) milling. By optimizing plasma treatment conditions, the quality of high-resolution images and diffraction patterns of the FIB-milled specimens has been remarkably improved using the plasma cleaner.

Original languageEnglish
Pages (from-to)23-26
Number of pages4
JournalJournal of Electron Microscopy
Volume55
Issue number1
DOIs
Publication statusPublished - Jan 2006

All Science Journal Classification (ASJC) codes

  • Instrumentation

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