Removing focused ion-beam damages on transmission electron microscopy specimens by using a plasma cleaner

Satoshi Hata, Harini Sosiati, Noriyuki Kuwano, Masaru Itakura, Takayoshi Nakano, Yukichi Umakoshi

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

A plasma cleaner is usually used for removing carbonaceous debris from a specimen and preventing contamination during transmission electron microscopy (TEM) imaging and analysis. However, the plasma cleaner can be effectively used for thinning down damage layers on TEM specimens prepared by focused ion-beam (FIB) milling. By optimizing plasma treatment conditions, the quality of high-resolution images and diffraction patterns of the FIB-milled specimens has been remarkably improved using the plasma cleaner.

Original languageEnglish
Pages (from-to)23-26
Number of pages4
JournalJournal of Electron Microscopy
Volume55
Issue number1
DOIs
Publication statusPublished - Jan 1 2006

Fingerprint

cleaners
Focused ion beams
Transmission Electron Microscopy
ion beams
Ions
Transmission electron microscopy
damage
Plasmas
transmission electron microscopy
Image resolution
debris
Debris
Diffraction patterns
contamination
Contamination
diffraction patterns
Imaging techniques
high resolution

All Science Journal Classification (ASJC) codes

  • Instrumentation

Cite this

Removing focused ion-beam damages on transmission electron microscopy specimens by using a plasma cleaner. / Hata, Satoshi; Sosiati, Harini; Kuwano, Noriyuki; Itakura, Masaru; Nakano, Takayoshi; Umakoshi, Yukichi.

In: Journal of Electron Microscopy, Vol. 55, No. 1, 01.01.2006, p. 23-26.

Research output: Contribution to journalArticle

Hata, Satoshi ; Sosiati, Harini ; Kuwano, Noriyuki ; Itakura, Masaru ; Nakano, Takayoshi ; Umakoshi, Yukichi. / Removing focused ion-beam damages on transmission electron microscopy specimens by using a plasma cleaner. In: Journal of Electron Microscopy. 2006 ; Vol. 55, No. 1. pp. 23-26.
@article{2f22d5f9837b48de9319b01298366cd7,
title = "Removing focused ion-beam damages on transmission electron microscopy specimens by using a plasma cleaner",
abstract = "A plasma cleaner is usually used for removing carbonaceous debris from a specimen and preventing contamination during transmission electron microscopy (TEM) imaging and analysis. However, the plasma cleaner can be effectively used for thinning down damage layers on TEM specimens prepared by focused ion-beam (FIB) milling. By optimizing plasma treatment conditions, the quality of high-resolution images and diffraction patterns of the FIB-milled specimens has been remarkably improved using the plasma cleaner.",
author = "Satoshi Hata and Harini Sosiati and Noriyuki Kuwano and Masaru Itakura and Takayoshi Nakano and Yukichi Umakoshi",
year = "2006",
month = "1",
day = "1",
doi = "10.1093/jmicro/dfl001",
language = "English",
volume = "55",
pages = "23--26",
journal = "Microscopy (Oxford, England)",
issn = "2050-5698",
publisher = "Japanese Society of Microscopy",
number = "1",

}

TY - JOUR

T1 - Removing focused ion-beam damages on transmission electron microscopy specimens by using a plasma cleaner

AU - Hata, Satoshi

AU - Sosiati, Harini

AU - Kuwano, Noriyuki

AU - Itakura, Masaru

AU - Nakano, Takayoshi

AU - Umakoshi, Yukichi

PY - 2006/1/1

Y1 - 2006/1/1

N2 - A plasma cleaner is usually used for removing carbonaceous debris from a specimen and preventing contamination during transmission electron microscopy (TEM) imaging and analysis. However, the plasma cleaner can be effectively used for thinning down damage layers on TEM specimens prepared by focused ion-beam (FIB) milling. By optimizing plasma treatment conditions, the quality of high-resolution images and diffraction patterns of the FIB-milled specimens has been remarkably improved using the plasma cleaner.

AB - A plasma cleaner is usually used for removing carbonaceous debris from a specimen and preventing contamination during transmission electron microscopy (TEM) imaging and analysis. However, the plasma cleaner can be effectively used for thinning down damage layers on TEM specimens prepared by focused ion-beam (FIB) milling. By optimizing plasma treatment conditions, the quality of high-resolution images and diffraction patterns of the FIB-milled specimens has been remarkably improved using the plasma cleaner.

UR - http://www.scopus.com/inward/record.url?scp=33646779889&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33646779889&partnerID=8YFLogxK

U2 - 10.1093/jmicro/dfl001

DO - 10.1093/jmicro/dfl001

M3 - Article

AN - SCOPUS:33646779889

VL - 55

SP - 23

EP - 26

JO - Microscopy (Oxford, England)

JF - Microscopy (Oxford, England)

SN - 2050-5698

IS - 1

ER -