Resonant inelastic X-ray scattering of EuNi2(Si1-xGe x)2 and Eu2O3 at Eu L3 absorption edge

H. Yamaoka, M. Taguchi, A. M. Vlaicu, H. Oohashi, K. Yokoi, D. Horiguchi, T. Tochio, Y. Ito, K. Kawatsura, K. Yamamoto, A. Chainani, S. Shin, M. Shiga, Hirofumi Wada

Research output: Contribution to journalArticle

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Abstract

Bulk sensitive spectroscopies were performed for mixed valent compounds EuNi2(Si1-xGex)2 as a function of x, and Eu-sesquioxide (Eu2O3), using techniques of high-resolution partial-fluorescence yield (PFY) and resonant inelastic x-ray scattering (RIXS) at the Eu L3 absorption edge. The evolution of mean-valency as a function of chemical composition x in EuNi2(Si 1-xGex)2 shows a drastic change between x = 0.5 and 0.7. The experimental results also show a small amount of mixed valency for the end members, i.e., x = 1 and 0 samples are also mixed valent. Single-impurity Anderson model calculations show good agreement with the PFY and RIXS experimental results, and thus provide a consistent set of electronic structure parameters. The composition controlled drastic change in meanvalence between x = 0.5 and 0.7 is derived from a large hybridization change, consistent with the Kondo volume collapse picture.

Original languageEnglish
Article number034702
Journaljournal of the physical society of japan
Volume75
Issue number3
DOIs
Publication statusPublished - Mar 1 2006

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x ray scattering
inelastic scattering
fluorescence
scattering
chemical composition
x rays
electronic structure
impurities
high resolution
spectroscopy

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

Resonant inelastic X-ray scattering of EuNi2(Si1-xGe x)2 and Eu2O3 at Eu L3 absorption edge. / Yamaoka, H.; Taguchi, M.; Vlaicu, A. M.; Oohashi, H.; Yokoi, K.; Horiguchi, D.; Tochio, T.; Ito, Y.; Kawatsura, K.; Yamamoto, K.; Chainani, A.; Shin, S.; Shiga, M.; Wada, Hirofumi.

In: journal of the physical society of japan, Vol. 75, No. 3, 034702, 01.03.2006.

Research output: Contribution to journalArticle

Yamaoka, H, Taguchi, M, Vlaicu, AM, Oohashi, H, Yokoi, K, Horiguchi, D, Tochio, T, Ito, Y, Kawatsura, K, Yamamoto, K, Chainani, A, Shin, S, Shiga, M & Wada, H 2006, 'Resonant inelastic X-ray scattering of EuNi2(Si1-xGe x)2 and Eu2O3 at Eu L3 absorption edge', journal of the physical society of japan, vol. 75, no. 3, 034702. https://doi.org/10.1143/JPSJ.75.034702
Yamaoka, H. ; Taguchi, M. ; Vlaicu, A. M. ; Oohashi, H. ; Yokoi, K. ; Horiguchi, D. ; Tochio, T. ; Ito, Y. ; Kawatsura, K. ; Yamamoto, K. ; Chainani, A. ; Shin, S. ; Shiga, M. ; Wada, Hirofumi. / Resonant inelastic X-ray scattering of EuNi2(Si1-xGe x)2 and Eu2O3 at Eu L3 absorption edge. In: journal of the physical society of japan. 2006 ; Vol. 75, No. 3.
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