Responses of organic and inorganic materials to intense EUV radiation from laser-produced plasmas

Tetsuya Makimura, Shuichi Torii, Daisuke Nakamura, Akihiko Takahashi, Tatsuo Okada, Hiroyuki Niino, Kouichi Murakami

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

We have investigated responses of polymers to EUV radiation from laser-produced plasmas beyond ablation thresholds and micromachining. We concentrated on fabricate precise 3D micro-structures of PDMS, PMMA, acrylic block copolymers (BCP), and silica. The micromachining technique can be applied to three-dimensional micro-fluidic and bio-medical devices. The EUV processing is a promising to realize a practical micromachining technique. In the present work, we used two EUV radiation sources; (a) Wide band EUV light in a range of 10{300 eV was generated by irradiation of Ta targets with Nd:YAG laser light at 500 mJ/pulse. (b) Narrow band EUV light at 11 and 13 nm was generated by irradiation of solid Xe and Sn targets, respectively, with pulsed TEA CO2 laser light. The generated EUV light was condensed onto the materials at high power density beyond the ablation thresholds, using ellipsoidal mirrors. We found that through-holes with a diameter of one micrometer can be fabricated in PMMA and PDMS sheets with thicknesses of 4-10 micrometers, at 250 and 230 nm/shot, respectively. The effective ablation of PMMA sheets can be applied to a LIGA-like process for fabricating micro-structures of metals for micro- and nano-molds. PDMS sheets are ablated if it is irradiated with EUV light beyond a distinct threshold power density, while PDMS surfaces were modified at lower power densities. Furthermore, BCP sheets were ablated to have 1-micrometer structures. Thus, we have developed a practical technique for micromachining of PMMA, PDMS and BCP sheets in a micrometer scale.

Original languageEnglish
Title of host publicationDamage to VUV, EUV, and X-Ray Optics IV; and EUV and X-Ray Optics
Subtitle of host publicationSynergy Between Laboratory and Space III
DOIs
Publication statusPublished - 2013
EventDamage to VUV, EUV, and X-Ray Optics IV; and EUV and X-Ray Optics: Synergy Between Laboratory and Space III - Prague, Czech Republic
Duration: Apr 15 2013Apr 18 2013

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8777
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Other

OtherDamage to VUV, EUV, and X-Ray Optics IV; and EUV and X-Ray Optics: Synergy Between Laboratory and Space III
CountryCzech Republic
CityPrague
Period4/15/134/18/13

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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