Responses of polymers to laser plasma EUV light beyond ablation threshold and micromachining

Tetsuya Makimura, Shuichi Torii, Kota Okazaki, Daisuke Nakamura, Akihiko Takahashi, Hiroyuki Niino, Tatsuo Okada, Kouichi Murakami

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

We have investigated responses of PDMS, PMMA and acrylic block copolymers (BCP) to EUV light from laserproduced plasma beyond ablation thresholds and micromachining. We generated wide band EUV light around 100 eV by irradiation of Ta targets with Nd:YAG laser light. In addition, narrow band EUV light at 11 and 13 nm were generated by irradiation of solid Xe and Sn targets, respectively, with pulsed CO2 laser light. The generated EUV light was condensed onto samples, using an ellipsoidal mirror. The EUV light was incident through windows of contact masks on the samples. We found that through-holes with a diameter of 1 μm can be fabricated in PDMS sheets with thicknesses of 10 μm. PDMS sheets are ablated if they are irradiated with EUV light beyond a threshold power density, while PDMS surfaces were modified by irradiation with the narrow band EUV light at lower power densities. Effective ablation of PMMA sheets can be applied to a LIGA-like process for fabricating micro-structures of metals using the practical apparatus. Furthermore, BCP sheets were ablated to have micro-structures. Thus, we have developed a practical technique for microma chining of PMMA, PDMS and BCP sheets in a micrometer scale.

Original languageEnglish
Title of host publicationDamage to VUV, EUV, and X-Ray Optics III
DOIs
Publication statusPublished - Jul 25 2011
EventDamage to VUV, EUV, and X-Ray Optics III - Prague, Czech Republic
Duration: Apr 18 2011Apr 20 2011

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8077
ISSN (Print)0277-786X

Other

OtherDamage to VUV, EUV, and X-Ray Optics III
CountryCzech Republic
CityPrague
Period4/18/114/20/11

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Makimura, T., Torii, S., Okazaki, K., Nakamura, D., Takahashi, A., Niino, H., ... Murakami, K. (2011). Responses of polymers to laser plasma EUV light beyond ablation threshold and micromachining. In Damage to VUV, EUV, and X-Ray Optics III [80770F] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8077). https://doi.org/10.1117/12.887615