Retention and release mechanisms of tritium loaded in plasma-sprayed tungsten coatings by plasma exposure

T. Otsuka, T. Tanabe, K. Tokunaga

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Abstract

Depth profiles of tritium (T) loaded by gas and plasma in tungsten (W) coatings on ferritic steels have been examined by using a tritium imaging plate technique and their changes during storage and after annealing have been monitored. The depth profiles of T consisted of 4 components, (I) T trapped at impurities and defects newly introduced in the near surface region of the coating by plasma loading, (II) T trapped at the inner surfaces of the grains and dissolved in the grains resulting in a flat depth profile throughout the whole coating, (III) T dissolved and diffused into the substrate giving a decaying profile, and (IV) T trapped at the backside surface of the substrate. The results support that retention of T is mainly caused by pore diffusion of gaseous T followed by dissolution and trapping in/at each W grain, and dissolution of T into the F82H substrate to allow permeation. Release of T proceeds in an opposite way of retention but each component desorbs independently.

Original languageEnglish
Pages (from-to)S1048-S1051
JournalJournal of Nuclear Materials
Volume438
Issue numberSUPPL
DOIs
Publication statusPublished - Jan 1 2013

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All Science Journal Classification (ASJC) codes

  • Nuclear and High Energy Physics
  • Materials Science(all)
  • Nuclear Energy and Engineering

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