Retention and release mechanisms of tritium loaded in plasma-sprayed tungsten coatings by plasma exposure

T. Otsuka, T. Tanabe, Kazutoshi Tokunaga

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

Depth profiles of tritium (T) loaded by gas and plasma in tungsten (W) coatings on ferritic steels have been examined by using a tritium imaging plate technique and their changes during storage and after annealing have been monitored. The depth profiles of T consisted of 4 components, (I) T trapped at impurities and defects newly introduced in the near surface region of the coating by plasma loading, (II) T trapped at the inner surfaces of the grains and dissolved in the grains resulting in a flat depth profile throughout the whole coating, (III) T dissolved and diffused into the substrate giving a decaying profile, and (IV) T trapped at the backside surface of the substrate. The results support that retention of T is mainly caused by pore diffusion of gaseous T followed by dissolution and trapping in/at each W grain, and dissolution of T into the F82H substrate to allow permeation. Release of T proceeds in an opposite way of retention but each component desorbs independently.

Original languageEnglish
JournalJournal of Nuclear Materials
Volume438
Issue numberSUPPL
DOIs
Publication statusPublished - Jan 1 2013

Fingerprint

Tungsten
Tritium
tritium
tungsten
Plasmas
coatings
Coatings
Dissolution
Substrates
profiles
Plasma Gases
dissolving
Ferritic steel
Permeation
Annealing
Impurities
Imaging techniques
Defects
trapping
steels

All Science Journal Classification (ASJC) codes

  • Nuclear and High Energy Physics
  • Nuclear Energy and Engineering
  • Materials Science(all)

Cite this

Retention and release mechanisms of tritium loaded in plasma-sprayed tungsten coatings by plasma exposure. / Otsuka, T.; Tanabe, T.; Tokunaga, Kazutoshi.

In: Journal of Nuclear Materials, Vol. 438, No. SUPPL, 01.01.2013.

Research output: Contribution to journalArticle

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