R.F. bias effect on ECR plasma

M. Murata, Y. Takeuchi, Y. Kai, Masayoshi Tanaka, Y. Kawai

    Research output: Contribution to journalArticle

    1 Citation (Scopus)

    Abstract

    An electron cyclotron resonance plasma is produced with a multislot antenna, where r.f. powers (13.56 MHz) are applied to a substrate. Plasma parameters measured with a probe are examined as a function of r.f. power and pressure. It is found that when the r.f. powers are applied, negative self-bias potential appears and the plasma density tends to decrease and the plasma potential increases. Furthermore, the effect of the negative self-bias potential on the radial profile of plasma parameters is discussed.

    Original languageEnglish
    Pages (from-to)512-515
    Number of pages4
    JournalSurface and Coatings Technology
    Volume74-75
    Issue numberPART 1
    DOIs
    Publication statusPublished - Jan 1 1995

    Fingerprint

    Plasmas
    plasma potentials
    electron cyclotron resonance
    plasma density
    Electron cyclotron resonance
    Plasma density
    antennas
    probes
    Antennas
    profiles
    Substrates

    All Science Journal Classification (ASJC) codes

    • Chemistry(all)
    • Condensed Matter Physics
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films
    • Materials Chemistry

    Cite this

    Murata, M., Takeuchi, Y., Kai, Y., Tanaka, M., & Kawai, Y. (1995). R.F. bias effect on ECR plasma. Surface and Coatings Technology, 74-75(PART 1), 512-515. https://doi.org/10.1016/0257-8972(95)08309-X

    R.F. bias effect on ECR plasma. / Murata, M.; Takeuchi, Y.; Kai, Y.; Tanaka, Masayoshi; Kawai, Y.

    In: Surface and Coatings Technology, Vol. 74-75, No. PART 1, 01.01.1995, p. 512-515.

    Research output: Contribution to journalArticle

    Murata, M, Takeuchi, Y, Kai, Y, Tanaka, M & Kawai, Y 1995, 'R.F. bias effect on ECR plasma', Surface and Coatings Technology, vol. 74-75, no. PART 1, pp. 512-515. https://doi.org/10.1016/0257-8972(95)08309-X
    Murata M, Takeuchi Y, Kai Y, Tanaka M, Kawai Y. R.F. bias effect on ECR plasma. Surface and Coatings Technology. 1995 Jan 1;74-75(PART 1):512-515. https://doi.org/10.1016/0257-8972(95)08309-X
    Murata, M. ; Takeuchi, Y. ; Kai, Y. ; Tanaka, Masayoshi ; Kawai, Y. / R.F. bias effect on ECR plasma. In: Surface and Coatings Technology. 1995 ; Vol. 74-75, No. PART 1. pp. 512-515.
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