R.F. bias effect on ECR plasma

M. Murata, Y. Takeuchi, Y. Kai, M. Tanaka, Y. Kawai

    Research output: Contribution to journalArticle

    1 Citation (Scopus)

    Abstract

    An electron cyclotron resonance plasma is produced with a multislot antenna, where r.f. powers (13.56 MHz) are applied to a substrate. Plasma parameters measured with a probe are examined as a function of r.f. power and pressure. It is found that when the r.f. powers are applied, negative self-bias potential appears and the plasma density tends to decrease and the plasma potential increases. Furthermore, the effect of the negative self-bias potential on the radial profile of plasma parameters is discussed.

    Original languageEnglish
    Pages (from-to)512-515
    Number of pages4
    JournalSurface and Coatings Technology
    Volume74-75
    Issue numberPART 1
    DOIs
    Publication statusPublished - Sep 1995

    All Science Journal Classification (ASJC) codes

    • Chemistry(all)
    • Condensed Matter Physics
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films
    • Materials Chemistry

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