Ferromagnetic Fe3 Si thin films with an extremely smooth surface morphology can be epitaxially grown on Si(111) at room temperature by facing target direct-current sputtering. The epitaxial relationship is Fe3 Si (111) ∥Si (111) with Fe3 Si [1 1- 0] ∥Si [1- 10]. By the application of the extinction rule of x-ray diffraction, the generated Fe3 Si was confirmed to possess a B2 structure and not a D O3 one. The film showed a saturation magnetization value of 960 emu cm3, which was slightly lower than that of bulk D O3 - Fe3 Si. It was observed that the magnetization easy axis was along the [1 1- 0] direction in the film plane.
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)