Ru cyclooctatetraene precursors for MOCVD

Tatsuya Ando, Naoki Nakata, Kazuharu Suzuki, Takahiro Matsumoto, Seiji Ogo

    Research output: Contribution to journalArticlepeer-review

    10 Citations (Scopus)

    Abstract

    A series of Ru 0 cyclooctatetraene complexes are presented with optimal properties for MOCVD (metal organic chemical vapour deposition) applications, including combinations of the two lowest melting points and lowest decomposition temperatures yet reported for such materials. The compounds are easy to handle and lead to highly conformal thin films of Ru on SiO 2 features; even within holes with aspect ratios of 40:1. SEM, AFM and XPS studies confirm the near ideal nature of the resulting conformal thin film.

    Original languageEnglish
    Pages (from-to)1678-1682
    Number of pages5
    JournalDalton Transactions
    Volume41
    Issue number6
    DOIs
    Publication statusPublished - Feb 14 2012

    All Science Journal Classification (ASJC) codes

    • Inorganic Chemistry

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