Abstract
A series of Ru 0 cyclooctatetraene complexes are presented with optimal properties for MOCVD (metal organic chemical vapour deposition) applications, including combinations of the two lowest melting points and lowest decomposition temperatures yet reported for such materials. The compounds are easy to handle and lead to highly conformal thin films of Ru on SiO 2 features; even within holes with aspect ratios of 40:1. SEM, AFM and XPS studies confirm the near ideal nature of the resulting conformal thin film.
| Original language | English |
|---|---|
| Pages (from-to) | 1678-1682 |
| Number of pages | 5 |
| Journal | Dalton Transactions |
| Volume | 41 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - Feb 14 2012 |
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All Science Journal Classification (ASJC) codes
- Inorganic Chemistry
Cite this
Ru cyclooctatetraene precursors for MOCVD. / Ando, Tatsuya; Nakata, Naoki; Suzuki, Kazuharu; Matsumoto, Takahiro; Ogo, Seiji.
In: Dalton Transactions, Vol. 41, No. 6, 14.02.2012, p. 1678-1682.Research output: Contribution to journal › Article
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TY - JOUR
T1 - Ru cyclooctatetraene precursors for MOCVD
AU - Ando, Tatsuya
AU - Nakata, Naoki
AU - Suzuki, Kazuharu
AU - Matsumoto, Takahiro
AU - Ogo, Seiji
PY - 2012/2/14
Y1 - 2012/2/14
N2 - A series of Ru 0 cyclooctatetraene complexes are presented with optimal properties for MOCVD (metal organic chemical vapour deposition) applications, including combinations of the two lowest melting points and lowest decomposition temperatures yet reported for such materials. The compounds are easy to handle and lead to highly conformal thin films of Ru on SiO 2 features; even within holes with aspect ratios of 40:1. SEM, AFM and XPS studies confirm the near ideal nature of the resulting conformal thin film.
AB - A series of Ru 0 cyclooctatetraene complexes are presented with optimal properties for MOCVD (metal organic chemical vapour deposition) applications, including combinations of the two lowest melting points and lowest decomposition temperatures yet reported for such materials. The compounds are easy to handle and lead to highly conformal thin films of Ru on SiO 2 features; even within holes with aspect ratios of 40:1. SEM, AFM and XPS studies confirm the near ideal nature of the resulting conformal thin film.
UR - http://www.scopus.com/inward/record.url?scp=84863020081&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84863020081&partnerID=8YFLogxK
U2 - 10.1039/c1dt11454a
DO - 10.1039/c1dt11454a
M3 - Article
VL - 41
SP - 1678
EP - 1682
JO - Dalton Transactions
JF - Dalton Transactions
SN - 1477-9226
IS - 6
ER -