Scanning tunneling microscopic and spectroscopic studies on a crystalline silica monolayer epitaxially formed on hexagonal SiC (000 1 ̄) surfaces

Hiroshi Tochihara; Tetsuroh Shirasawa; Takayuki Suzuki; Toshio Miyamachi; Takashi Kajiwara; Kazuma Yagyu; Shunsuke Yoshizawa; Toshio Takahashi; Satoru Tanaka; Fumio Komori

doi:10.1063/1.4863753

Scanning tunneling microscopic and spectroscopic studies on a crystalline silica monolayer epitaxially formed on hexagonal SiC (000 1 ̄) surfaces

Hiroshi Tochihara, Tetsuroh Shirasawa, Takayuki Suzuki, Toshio Miyamachi, Takashi Kajiwara, Kazuma Yagyu, Shunsuke Yoshizawa, Toshio Takahashi, Satoru Tanaka, Fumio Komori

Applied Physics

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

An epitaxial silicon-oxide monolayer of chemical composition of Si ₂O₃ (the Si₂O₃ layer) formed on hexagonal SiC(0001̄) surfaces has been observed by scanning tunneling microscopy (STM). Filled- and empty-state STM images with atomic resolution support the previously reported model. Typical structural defects in the Si ₂O₃ layer are found to be missing SiO_n (n=1, 2, 3) molecules. The band gap of the Si₂O₃ layer obtained by point tunneling spectroscopy is 5.5±0.5eV, exhibiting considerable narrowing from that of bulk SiO₂, 8.9eV. It is proposed that the Si₂O₃ layer is suitable as a relevant interface material for formation of SiC-based metal-oxide-semiconductor devices.

Original language	English
Article number	051601
Journal	Applied Physics Letters
Volume	104
Issue number	5
DOIs	https://doi.org/10.1063/1.4863753
Publication status	Published - Feb 3 2014

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.4863753

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title = "Scanning tunneling microscopic and spectroscopic studies on a crystalline silica monolayer epitaxially formed on hexagonal SiC (000 1{\= }) surfaces",

abstract = "An epitaxial silicon-oxide monolayer of chemical composition of Si 2O3 (the Si2O3 layer) formed on hexagonal SiC(000{\=1}) surfaces has been observed by scanning tunneling microscopy (STM). Filled- and empty-state STM images with atomic resolution support the previously reported model. Typical structural defects in the Si 2O3 layer are found to be missing SiOn (n=1, 2, 3) molecules. The band gap of the Si2O3 layer obtained by point tunneling spectroscopy is 5.5±0.5eV, exhibiting considerable narrowing from that of bulk SiO2, 8.9eV. It is proposed that the Si2O3 layer is suitable as a relevant interface material for formation of SiC-based metal-oxide-semiconductor devices.",

author = "Hiroshi Tochihara and Tetsuroh Shirasawa and Takayuki Suzuki and Toshio Miyamachi and Takashi Kajiwara and Kazuma Yagyu and Shunsuke Yoshizawa and Toshio Takahashi and Satoru Tanaka and Fumio Komori",

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T1 - Scanning tunneling microscopic and spectroscopic studies on a crystalline silica monolayer epitaxially formed on hexagonal SiC (000 1 ̄) surfaces

AU - Tochihara, Hiroshi

AU - Shirasawa, Tetsuroh

AU - Suzuki, Takayuki

AU - Miyamachi, Toshio

AU - Kajiwara, Takashi

AU - Yagyu, Kazuma

AU - Yoshizawa, Shunsuke

AU - Takahashi, Toshio

AU - Tanaka, Satoru

AU - Komori, Fumio

PY - 2014/2/3

Y1 - 2014/2/3

N2 - An epitaxial silicon-oxide monolayer of chemical composition of Si 2O3 (the Si2O3 layer) formed on hexagonal SiC(0001̄) surfaces has been observed by scanning tunneling microscopy (STM). Filled- and empty-state STM images with atomic resolution support the previously reported model. Typical structural defects in the Si 2O3 layer are found to be missing SiOn (n=1, 2, 3) molecules. The band gap of the Si2O3 layer obtained by point tunneling spectroscopy is 5.5±0.5eV, exhibiting considerable narrowing from that of bulk SiO2, 8.9eV. It is proposed that the Si2O3 layer is suitable as a relevant interface material for formation of SiC-based metal-oxide-semiconductor devices.

AB - An epitaxial silicon-oxide monolayer of chemical composition of Si 2O3 (the Si2O3 layer) formed on hexagonal SiC(0001̄) surfaces has been observed by scanning tunneling microscopy (STM). Filled- and empty-state STM images with atomic resolution support the previously reported model. Typical structural defects in the Si 2O3 layer are found to be missing SiOn (n=1, 2, 3) molecules. The band gap of the Si2O3 layer obtained by point tunneling spectroscopy is 5.5±0.5eV, exhibiting considerable narrowing from that of bulk SiO2, 8.9eV. It is proposed that the Si2O3 layer is suitable as a relevant interface material for formation of SiC-based metal-oxide-semiconductor devices.

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Scanning tunneling microscopic and spectroscopic studies on a crystalline silica monolayer epitaxially formed on hexagonal SiC (000 1 ̄) surfaces

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