Schottky barrier height control at metal/Ge interface by insertion of nitrogen contained amorphous layer

Keisuke Yamamoto, Dong Wang, Hiroshi Nakashima

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Ge is attracting great attention as a candidate of channel material for future CMOS devices and near-infrared optical devices, owing to its high intrinsic carrier mobility and narrow bandgap. One of the difficulties to realize Ge-based devices is to control of the Schottky barrier height (SBH) at metal/Ge interface. It is widely known any metal/Ge contacts show high electron barrier height (ΦBN > 0.5 eV) due to Fermi level pinning (FLP) at the metal/Ge interface. Our group found a method to alleviate the FLP, by which sputter-deposited ZrN/Ge contact showed low ΦBN (< 0.10 eV) and high hole barrier height (ΦBP > 0.56 eV). From detailed structural analyses, FLP alleviation was induced by a nitrogen contained amorphous interlayer (a-IL) formed during ZrN sputter-deposition. If we can change the kind of metal on a-IL, we may extend the control range of SBH. In this paper, we demonstrate the wide range SBH control for metal/a-IL/Ge contacts.

Original languageEnglish
Title of host publication239th ECS Meeting with the 18th International Meeting on Chemical Sensors, IMCS 2021 - High Purity and High Mobility Semiconductors 16
EditorsE. Simoen, O. Kononchuk, O. Nakatsuka, C. Claeys
PublisherIOP Publishing Ltd.
Pages63-71
Number of pages9
Edition4
ISBN (Electronic)9781607685395
DOIs
Publication statusPublished - 2021
Event239th ECS Meeting with the 18th International Meeting on Chemical Sensors, IMCS 2021 - Chicago, United States
Duration: May 30 2021Jun 3 2021

Publication series

NameECS Transactions
Number4
Volume102
ISSN (Print)1938-6737
ISSN (Electronic)1938-5862

Conference

Conference239th ECS Meeting with the 18th International Meeting on Chemical Sensors, IMCS 2021
Country/TerritoryUnited States
CityChicago
Period5/30/216/3/21

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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