Abstract
We report substantial improvement of the field emission properties from aligned carbon nanotubes grown on aligned carbon nanofibres by a two-stage plasma enhanced chemical vapour deposition (PECVD) process. The threshold field decreased from 15.0 to 3.6 V/μm after the secondary growth. The field enhancement factor increased from 240 to 1480. This technique allows for superior emission of electrons for carbon nanotube/nanofibre arrays grown directly on highly doped silicon for direct integration in large area displays.
Original language | English |
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Pages (from-to) | 2147-2150 |
Number of pages | 4 |
Journal | Journal of nanoscience and nanotechnology |
Volume | 8 |
Issue number | 4 |
DOIs | |
Publication status | Published - Apr 2008 |
Externally published | Yes |
All Science Journal Classification (ASJC) codes
- Bioengineering
- Chemistry(all)
- Biomedical Engineering
- Materials Science(all)
- Condensed Matter Physics