Self-ordering of nanofacets on vicinal sic surfaces

Hiroshi Nakagawa, Satoru Tanaka, Ikuo Suemune

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Abstract

Vicinal [Formula presented] and [Formula presented] surfaces have been investigated using atomic force microscopy and cross-sectional high-resolution transmission electron microscopy. We observed the characteristic self-ordering of nanofacets on any surface, regardless of polytypes and vicinal angles, after gas etching at high temperature. Two facet planes are typically revealed: (0001) and high index [Formula presented] that are induced by equilibrium surface phase separation. A [Formula presented] plane may have a free energy minimum due to attractive step-step interactions. The differing ordering distances in [Formula presented] and [Formula presented] polytypes imply the existence of SiC polytypic dependence on nanofaceting. Thus, it should be possible to control SiC surface nanostructures by selecting a polytype, a vicinal angle, and an etching temperature.

Original languageEnglish
JournalPhysical Review Letters
Volume91
Issue number22
DOIs
Publication statusPublished - Jan 1 2003
Externally publishedYes

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All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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