Self-organized near-field etching of the sidewalls of glass corrugations

T. Yatsui, K. Hirata, Y. Tabata, Y. Miyake, Y. Akita, M. Yoshimoto, W. Nomura, T. Kawazoe, M. Naruse, M. Ohtsu

    Research output: Contribution to journalArticlepeer-review

    10 Citations (Scopus)

    Abstract

    Using soda-lime glass with a nano-stripe pattern as a test specimen, we demonstrated self-organized near-field etching with a continuum-wave laser (λ=532 nm) light source. Atomic force microscopy confirmed that near-field etching decreases the flank roughness of the corrugations as well as the roughness of the flat surface.

    Original languageEnglish
    Pages (from-to)527-530
    Number of pages4
    JournalApplied Physics B: Lasers and Optics
    Volume103
    Issue number3
    DOIs
    Publication statusPublished - Jun 2011

    All Science Journal Classification (ASJC) codes

    • Physics and Astronomy (miscellaneous)
    • Physics and Astronomy(all)

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