Self-organized near-field etching of the sidewalls of glass corrugations

T. Yatsui, K. Hirata, Y. Tabata, Y. Miyake, Y. Akita, M. Yoshimoto, Wataru Nomura, T. Kawazoe, M. Naruse, M. Ohtsu

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

Using soda-lime glass with a nano-stripe pattern as a test specimen, we demonstrated self-organized near-field etching with a continuum-wave laser (λ=532 nm) light source. Atomic force microscopy confirmed that near-field etching decreases the flank roughness of the corrugations as well as the roughness of the flat surface.

Original languageEnglish
Pages (from-to)527-530
Number of pages4
JournalApplied Physics B: Lasers and Optics
Volume103
Issue number3
DOIs
Publication statusPublished - Jun 1 2011

Fingerprint

near fields
roughness
etching
glass
calcium oxides
flat surfaces
light sources
atomic force microscopy
continuums
lasers

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Cite this

Yatsui, T., Hirata, K., Tabata, Y., Miyake, Y., Akita, Y., Yoshimoto, M., ... Ohtsu, M. (2011). Self-organized near-field etching of the sidewalls of glass corrugations. Applied Physics B: Lasers and Optics, 103(3), 527-530. https://doi.org/10.1007/s00340-011-4569-1

Self-organized near-field etching of the sidewalls of glass corrugations. / Yatsui, T.; Hirata, K.; Tabata, Y.; Miyake, Y.; Akita, Y.; Yoshimoto, M.; Nomura, Wataru; Kawazoe, T.; Naruse, M.; Ohtsu, M.

In: Applied Physics B: Lasers and Optics, Vol. 103, No. 3, 01.06.2011, p. 527-530.

Research output: Contribution to journalArticle

Yatsui, T, Hirata, K, Tabata, Y, Miyake, Y, Akita, Y, Yoshimoto, M, Nomura, W, Kawazoe, T, Naruse, M & Ohtsu, M 2011, 'Self-organized near-field etching of the sidewalls of glass corrugations', Applied Physics B: Lasers and Optics, vol. 103, no. 3, pp. 527-530. https://doi.org/10.1007/s00340-011-4569-1
Yatsui, T. ; Hirata, K. ; Tabata, Y. ; Miyake, Y. ; Akita, Y. ; Yoshimoto, M. ; Nomura, Wataru ; Kawazoe, T. ; Naruse, M. ; Ohtsu, M. / Self-organized near-field etching of the sidewalls of glass corrugations. In: Applied Physics B: Lasers and Optics. 2011 ; Vol. 103, No. 3. pp. 527-530.
@article{6774ad9d0c5d475890b6616857ea234d,
title = "Self-organized near-field etching of the sidewalls of glass corrugations",
abstract = "Using soda-lime glass with a nano-stripe pattern as a test specimen, we demonstrated self-organized near-field etching with a continuum-wave laser (λ=532 nm) light source. Atomic force microscopy confirmed that near-field etching decreases the flank roughness of the corrugations as well as the roughness of the flat surface.",
author = "T. Yatsui and K. Hirata and Y. Tabata and Y. Miyake and Y. Akita and M. Yoshimoto and Wataru Nomura and T. Kawazoe and M. Naruse and M. Ohtsu",
year = "2011",
month = "6",
day = "1",
doi = "10.1007/s00340-011-4569-1",
language = "English",
volume = "103",
pages = "527--530",
journal = "Applied Physics B: Lasers and Optics",
issn = "0946-2171",
publisher = "Springer Verlag",
number = "3",

}

TY - JOUR

T1 - Self-organized near-field etching of the sidewalls of glass corrugations

AU - Yatsui, T.

AU - Hirata, K.

AU - Tabata, Y.

AU - Miyake, Y.

AU - Akita, Y.

AU - Yoshimoto, M.

AU - Nomura, Wataru

AU - Kawazoe, T.

AU - Naruse, M.

AU - Ohtsu, M.

PY - 2011/6/1

Y1 - 2011/6/1

N2 - Using soda-lime glass with a nano-stripe pattern as a test specimen, we demonstrated self-organized near-field etching with a continuum-wave laser (λ=532 nm) light source. Atomic force microscopy confirmed that near-field etching decreases the flank roughness of the corrugations as well as the roughness of the flat surface.

AB - Using soda-lime glass with a nano-stripe pattern as a test specimen, we demonstrated self-organized near-field etching with a continuum-wave laser (λ=532 nm) light source. Atomic force microscopy confirmed that near-field etching decreases the flank roughness of the corrugations as well as the roughness of the flat surface.

UR - http://www.scopus.com/inward/record.url?scp=79959493184&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79959493184&partnerID=8YFLogxK

U2 - 10.1007/s00340-011-4569-1

DO - 10.1007/s00340-011-4569-1

M3 - Article

AN - SCOPUS:79959493184

VL - 103

SP - 527

EP - 530

JO - Applied Physics B: Lasers and Optics

JF - Applied Physics B: Lasers and Optics

SN - 0946-2171

IS - 3

ER -