Sensitivity to refractive index of high-aspect-ratio nanofins with optical vortex

Etsuo Maeda, Yaerim Lee, Youjiro Kobayashi, Akiko Taino, Mari Koizumi, Shigenori Fujikawa, Jean Jacques Delaunay

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

An easy and large-scale fabrication technique of metal fins was used to produce periodic Au fin arrays that realized light confinement in the near-infrared region. Light confinement was revealed by vortex patterns in the optical power flow of an array of high-aspect-ratio fins (height of 1000 nm for a width of 50 nm). The light confinement resulted in sharp dips in the reflectance spectrum of the high-aspect-ratio fin array. The wavelengths of the reflectance dips were found to shift toward higher values when the refractive index of the surrounding medium was increased. Experimental and simulated dip shift values were in good agreement with a demonstrated sensitivity of 580 nm per refractive index unit.

Original languageEnglish
Article number505502
JournalNanotechnology
Volume23
Issue number50
DOIs
Publication statusPublished - Dec 21 2012

Fingerprint

Aspect ratio
Refractive index
Vortex flow
Metals
Infrared radiation
Fabrication
Wavelength
nanofin

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

Cite this

Maeda, E., Lee, Y., Kobayashi, Y., Taino, A., Koizumi, M., Fujikawa, S., & Delaunay, J. J. (2012). Sensitivity to refractive index of high-aspect-ratio nanofins with optical vortex. Nanotechnology, 23(50), [505502]. https://doi.org/10.1088/0957-4484/23/50/505502

Sensitivity to refractive index of high-aspect-ratio nanofins with optical vortex. / Maeda, Etsuo; Lee, Yaerim; Kobayashi, Youjiro; Taino, Akiko; Koizumi, Mari; Fujikawa, Shigenori; Delaunay, Jean Jacques.

In: Nanotechnology, Vol. 23, No. 50, 505502, 21.12.2012.

Research output: Contribution to journalArticle

Maeda, E, Lee, Y, Kobayashi, Y, Taino, A, Koizumi, M, Fujikawa, S & Delaunay, JJ 2012, 'Sensitivity to refractive index of high-aspect-ratio nanofins with optical vortex', Nanotechnology, vol. 23, no. 50, 505502. https://doi.org/10.1088/0957-4484/23/50/505502
Maeda, Etsuo ; Lee, Yaerim ; Kobayashi, Youjiro ; Taino, Akiko ; Koizumi, Mari ; Fujikawa, Shigenori ; Delaunay, Jean Jacques. / Sensitivity to refractive index of high-aspect-ratio nanofins with optical vortex. In: Nanotechnology. 2012 ; Vol. 23, No. 50.
@article{2c4819e661dc4fe185d3d696e69a1628,
title = "Sensitivity to refractive index of high-aspect-ratio nanofins with optical vortex",
abstract = "An easy and large-scale fabrication technique of metal fins was used to produce periodic Au fin arrays that realized light confinement in the near-infrared region. Light confinement was revealed by vortex patterns in the optical power flow of an array of high-aspect-ratio fins (height of 1000 nm for a width of 50 nm). The light confinement resulted in sharp dips in the reflectance spectrum of the high-aspect-ratio fin array. The wavelengths of the reflectance dips were found to shift toward higher values when the refractive index of the surrounding medium was increased. Experimental and simulated dip shift values were in good agreement with a demonstrated sensitivity of 580 nm per refractive index unit.",
author = "Etsuo Maeda and Yaerim Lee and Youjiro Kobayashi and Akiko Taino and Mari Koizumi and Shigenori Fujikawa and Delaunay, {Jean Jacques}",
year = "2012",
month = "12",
day = "21",
doi = "10.1088/0957-4484/23/50/505502",
language = "English",
volume = "23",
journal = "Nanotechnology",
issn = "0957-4484",
publisher = "IOP Publishing Ltd.",
number = "50",

}

TY - JOUR

T1 - Sensitivity to refractive index of high-aspect-ratio nanofins with optical vortex

AU - Maeda, Etsuo

AU - Lee, Yaerim

AU - Kobayashi, Youjiro

AU - Taino, Akiko

AU - Koizumi, Mari

AU - Fujikawa, Shigenori

AU - Delaunay, Jean Jacques

PY - 2012/12/21

Y1 - 2012/12/21

N2 - An easy and large-scale fabrication technique of metal fins was used to produce periodic Au fin arrays that realized light confinement in the near-infrared region. Light confinement was revealed by vortex patterns in the optical power flow of an array of high-aspect-ratio fins (height of 1000 nm for a width of 50 nm). The light confinement resulted in sharp dips in the reflectance spectrum of the high-aspect-ratio fin array. The wavelengths of the reflectance dips were found to shift toward higher values when the refractive index of the surrounding medium was increased. Experimental and simulated dip shift values were in good agreement with a demonstrated sensitivity of 580 nm per refractive index unit.

AB - An easy and large-scale fabrication technique of metal fins was used to produce periodic Au fin arrays that realized light confinement in the near-infrared region. Light confinement was revealed by vortex patterns in the optical power flow of an array of high-aspect-ratio fins (height of 1000 nm for a width of 50 nm). The light confinement resulted in sharp dips in the reflectance spectrum of the high-aspect-ratio fin array. The wavelengths of the reflectance dips were found to shift toward higher values when the refractive index of the surrounding medium was increased. Experimental and simulated dip shift values were in good agreement with a demonstrated sensitivity of 580 nm per refractive index unit.

UR - http://www.scopus.com/inward/record.url?scp=84870456703&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84870456703&partnerID=8YFLogxK

U2 - 10.1088/0957-4484/23/50/505502

DO - 10.1088/0957-4484/23/50/505502

M3 - Article

C2 - 23186947

AN - SCOPUS:84870456703

VL - 23

JO - Nanotechnology

JF - Nanotechnology

SN - 0957-4484

IS - 50

M1 - 505502

ER -