Significance of kinetic-linkage of oxygen vacancy with SiO2/Si interface for SiO2-IL scavenging in HfO2 gate stacks

Xiuyan Li, Takeaki Yajima, Tomonori Nishimura, Akira Toriumi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Fingerprint

Dive into the research topics of 'Significance of kinetic-linkage of oxygen vacancy with SiO2/Si interface for SiO2-IL scavenging in HfO2 gate stacks'. Together they form a unique fingerprint.

Engineering & Materials Science

Chemical Compounds