Silica deposition induced by isolated aluminum ions bound on chelate resin as a model compound of the surface of microbes

Shuqin Bai, Gaowa Naren, Hiroaki Noma, Mayumi Etou, Hironori Ohashi, Yasuhiro Fujino, Katsumi Doi, Yoshihiro Okaue, Takushi Yokoyama

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Abstract

To elucidate the mechanism of silica biodeposition in hot spring water, which is induced by Al 3+ ions bound to the surface of microbes, a chelate resin (Chelex 100) was used as a model compound of the surface of microbes. No silicic acid was adsorbed on the Na type Chelex 100, whereas silicic acids were significantly adsorbed to the Al type Chelex 100. In the Al type Chelex 100, the Al 3+ ions were present as 1:1 tridentate complex with iminodiacetate (IDA) group. After adsorption of silicic acid to Al type Chelex 100, a IDAAlOSi(OH) 3 site formed. The site acted as a template for the successive adsorption of silicic acids to form silica sheets around Al type Chelex 100 particles. In conclusion, Al 3+ ions bound to the surface of microbes play a key role as a trigger for the biodeposition of silica in hot spring water.

Original languageEnglish
Pages (from-to)208-213
Number of pages6
JournalColloids and Surfaces B: Biointerfaces
Volume95
DOIs
Publication statusPublished - Jun 15 2012

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All Science Journal Classification (ASJC) codes

  • Biotechnology
  • Surfaces and Interfaces
  • Physical and Theoretical Chemistry
  • Colloid and Surface Chemistry

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