Silicon (110) grid for ion beam processing systems

R. Sawada, E. Higurashi, F. Shimokawa, O. Ohguchi, A. Tago

    Research output: Contribution to journalArticlepeer-review

    1 Citation (Scopus)

    Abstract

    Grids fabricated by anisotropically etching (110) silicon have been investigated for use in extracting and accelerating ions through their apertures. The silicon grids provide stable ion beams, resulting in a life span that is five times that of conventional stainless-steel grids of the same grid thickness, and large thickness for the same open areas. The silicon grids also have a big advantage because they do not experience the substantial plastic deformation that stainless-steel grids do. In addition, they provide a density of ions a few times higher than conventional carbon grids, although their life span is shorter. Moreover, they can protect samples from being contaminated by impurities such as heavy metals contained in stainless steel. Therefore, silicon grids are suitable for fabricating optical elements, such as microlenses and optical films in optical microelectromechanical systems.

    Original languageEnglish
    Pages (from-to)561-566
    Number of pages6
    JournalJournal of Micromechanics and Microengineering
    Volume11
    Issue number5
    DOIs
    Publication statusPublished - Sep 1 2001

    All Science Journal Classification (ASJC) codes

    • Electronic, Optical and Magnetic Materials
    • Mechanics of Materials
    • Mechanical Engineering
    • Electrical and Electronic Engineering

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