Silicon (110) grid for ion beam processing systems

Renshi Sawada, E. Higurashi, F. Shimokawa, O. Ohguchi, A. Tago

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Grids fabricated by anisotropically etching (110) silicon have been investigated for use in extracting and accelerating ions through their apertures. The silicon grids provide stable ion beams, resulting in a life span that is five times that of conventional stainless-steel grids of the same grid thickness, and large thickness for the same open areas. The silicon grids also have a big advantage because they do not experience the substantial plastic deformation that stainless-steel grids do. In addition, they provide a density of ions a few times higher than conventional carbon grids, although their life span is shorter. Moreover, they can protect samples from being contaminated by impurities such as heavy metals contained in stainless steel. Therefore, silicon grids are suitable for fabricating optical elements, such as microlenses and optical films in optical microelectromechanical systems.

Original languageEnglish
Pages (from-to)561-566
Number of pages6
JournalJournal of Micromechanics and Microengineering
Volume11
Issue number5
DOIs
Publication statusPublished - Sep 1 2001

Fingerprint

Silicon
Ion beams
Stainless Steel
ion beams
grids
Stainless steel
silicon
Processing
Ions
Microlenses
Optical films
life span
stainless steels
Optical devices
Heavy Metals
Heavy metals
MEMS
Etching
Plastic deformation
Carbon

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

Cite this

Sawada, R., Higurashi, E., Shimokawa, F., Ohguchi, O., & Tago, A. (2001). Silicon (110) grid for ion beam processing systems. Journal of Micromechanics and Microengineering, 11(5), 561-566. https://doi.org/10.1088/0960-1317/11/5/318

Silicon (110) grid for ion beam processing systems. / Sawada, Renshi; Higurashi, E.; Shimokawa, F.; Ohguchi, O.; Tago, A.

In: Journal of Micromechanics and Microengineering, Vol. 11, No. 5, 01.09.2001, p. 561-566.

Research output: Contribution to journalArticle

Sawada, R, Higurashi, E, Shimokawa, F, Ohguchi, O & Tago, A 2001, 'Silicon (110) grid for ion beam processing systems', Journal of Micromechanics and Microengineering, vol. 11, no. 5, pp. 561-566. https://doi.org/10.1088/0960-1317/11/5/318
Sawada, Renshi ; Higurashi, E. ; Shimokawa, F. ; Ohguchi, O. ; Tago, A. / Silicon (110) grid for ion beam processing systems. In: Journal of Micromechanics and Microengineering. 2001 ; Vol. 11, No. 5. pp. 561-566.
@article{4c2afa8f315a46fb9044f4fccc339841,
title = "Silicon (110) grid for ion beam processing systems",
abstract = "Grids fabricated by anisotropically etching (110) silicon have been investigated for use in extracting and accelerating ions through their apertures. The silicon grids provide stable ion beams, resulting in a life span that is five times that of conventional stainless-steel grids of the same grid thickness, and large thickness for the same open areas. The silicon grids also have a big advantage because they do not experience the substantial plastic deformation that stainless-steel grids do. In addition, they provide a density of ions a few times higher than conventional carbon grids, although their life span is shorter. Moreover, they can protect samples from being contaminated by impurities such as heavy metals contained in stainless steel. Therefore, silicon grids are suitable for fabricating optical elements, such as microlenses and optical films in optical microelectromechanical systems.",
author = "Renshi Sawada and E. Higurashi and F. Shimokawa and O. Ohguchi and A. Tago",
year = "2001",
month = "9",
day = "1",
doi = "10.1088/0960-1317/11/5/318",
language = "English",
volume = "11",
pages = "561--566",
journal = "Journal of Micromechanics and Microengineering",
issn = "0960-1317",
publisher = "IOP Publishing Ltd.",
number = "5",

}

TY - JOUR

T1 - Silicon (110) grid for ion beam processing systems

AU - Sawada, Renshi

AU - Higurashi, E.

AU - Shimokawa, F.

AU - Ohguchi, O.

AU - Tago, A.

PY - 2001/9/1

Y1 - 2001/9/1

N2 - Grids fabricated by anisotropically etching (110) silicon have been investigated for use in extracting and accelerating ions through their apertures. The silicon grids provide stable ion beams, resulting in a life span that is five times that of conventional stainless-steel grids of the same grid thickness, and large thickness for the same open areas. The silicon grids also have a big advantage because they do not experience the substantial plastic deformation that stainless-steel grids do. In addition, they provide a density of ions a few times higher than conventional carbon grids, although their life span is shorter. Moreover, they can protect samples from being contaminated by impurities such as heavy metals contained in stainless steel. Therefore, silicon grids are suitable for fabricating optical elements, such as microlenses and optical films in optical microelectromechanical systems.

AB - Grids fabricated by anisotropically etching (110) silicon have been investigated for use in extracting and accelerating ions through their apertures. The silicon grids provide stable ion beams, resulting in a life span that is five times that of conventional stainless-steel grids of the same grid thickness, and large thickness for the same open areas. The silicon grids also have a big advantage because they do not experience the substantial plastic deformation that stainless-steel grids do. In addition, they provide a density of ions a few times higher than conventional carbon grids, although their life span is shorter. Moreover, they can protect samples from being contaminated by impurities such as heavy metals contained in stainless steel. Therefore, silicon grids are suitable for fabricating optical elements, such as microlenses and optical films in optical microelectromechanical systems.

UR - http://www.scopus.com/inward/record.url?scp=0035444022&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035444022&partnerID=8YFLogxK

U2 - 10.1088/0960-1317/11/5/318

DO - 10.1088/0960-1317/11/5/318

M3 - Article

AN - SCOPUS:0035444022

VL - 11

SP - 561

EP - 566

JO - Journal of Micromechanics and Microengineering

JF - Journal of Micromechanics and Microengineering

SN - 0960-1317

IS - 5

ER -