Similarities in spatial distributions of absolute GeH2 density, radical production rate and particle amount in GeH4 RF discharges

Hiroharu Kawasaki; Junichirou Kida; Kazutaka Sakamoto; Tsuyoshi Fukuzawa; Masaharu Shiratani; Yukio Watanabe

Similarities in spatial distributions of absolute GeH₂ density, radical production rate and particle amount in GeH₄ RF discharges

Hiroharu Kawasaki, Junichirou Kida, Kazutaka Sakamoto, Tsuyoshi Fukuzawa, Masaharu Shiratani, Yukio Watanabe

Research output: Contribution to journal › Article

Abstract

In order to study the particle growth processes in GeH₄ RF discharges, the spatial distribution of the absolute GeH₂ density is measured for the first time together with those of particle amount and radical production rate (Ge emission intensity) in a moderately high power range of 0.5-1.0 W/cm². The particles are generated and grow around the plasma/sheath boundary near the powered electrode, and the spatial distribution of their amount is similar to those of radical production rate and GeH₂ density. Furthermore, GeH₂ density is about 10¹⁰ cm^-3, being close to SiH₂ density in SiH₄ discharges for the similar conditions of RF power and pressure. These results indicate that GeH₂ is a highly reactive radical having a high production rate and hence is a candidate for the main contributor to the particle growth.

Original language	English
Pages (from-to)	L475-L477
Journal	Japanese Journal of Applied Physics, Part 2: Letters
Volume	37
Issue number	4 B
Publication status	Published - Jan 1 1998

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All Science Journal Classification (ASJC) codes

Engineering(all)
Physics and Astronomy (miscellaneous)
Physics and Astronomy(all)

Cite this

Kawasaki, H., Kida, J., Sakamoto, K., Fukuzawa, T., Shiratani, M., & Watanabe, Y. (1998). Similarities in spatial distributions of absolute GeH₂ density, radical production rate and particle amount in GeH₄ RF discharges. Japanese Journal of Applied Physics, Part 2: Letters, 37(4 B), L475-L477.

Similarities in spatial distributions of absolute GeH₂ density, radical production rate and particle amount in GeH₄ RF discharges. / Kawasaki, Hiroharu; Kida, Junichirou; Sakamoto, Kazutaka; Fukuzawa, Tsuyoshi; Shiratani, Masaharu ; Watanabe, Yukio.

In: Japanese Journal of Applied Physics, Part 2: Letters, Vol. 37, No. 4 B, 01.01.1998, p. L475-L477.

Research output: Contribution to journal › Article

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