Simulation of effective production of very high frequency hydrogen plasma using a balanced power feeding method

Kohei Ogiwara; Weiting Chen; Kiichiro Uchino; Yoshinobu Kawai

doi:10.7567/JJAP.52.11ND01

Simulation of effective production of very high frequency hydrogen plasma using a balanced power feeding method

Kohei Ogiwara, Weiting Chen, Kiichiro Uchino, Yoshinobu Kawai

Electrical Engineering Sciences

Research output: Contribution to journal › Article

2 Citations (Scopus)

Abstract

The characteristics of a VHF hydrogen plasma produced by a balanced power feeding method were examined by using a two-dimensional Monte Carlo fluid hybrid model. The simulation results showed that the electron density is maximum at a certain pressure between the discharge electrodes and significantly decreases outside the electrodes at a high gas pressure. The power absorption efficiency between the electrodes was improved by increasing the gas pressure. In addition, the plasma was produced efficiently between the electrodes at low applied voltages.

Original language	English
Article number	11ND01
Journal	Japanese Journal of Applied Physics
Volume	52
Issue number	11 PART 2
DOIs	https://doi.org/10.7567/JJAP.52.11ND01
Publication status	Published - Nov 1 2013

Fingerprint

All Science Journal Classification (ASJC) codes

Engineering(all)
Physics and Astronomy(all)

Cite this

Ogiwara, K., Chen, W., Uchino, K., & Kawai, Y. (2013). Simulation of effective production of very high frequency hydrogen plasma using a balanced power feeding method. Japanese Journal of Applied Physics, 52(11 PART 2), [11ND01]. https://doi.org/10.7567/JJAP.52.11ND01

@article{c970616bf8e24158ba28ab75992487ef,

title = "Simulation of effective production of very high frequency hydrogen plasma using a balanced power feeding method",

abstract = "The characteristics of a VHF hydrogen plasma produced by a balanced power feeding method were examined by using a two-dimensional Monte Carlo fluid hybrid model. The simulation results showed that the electron density is maximum at a certain pressure between the discharge electrodes and significantly decreases outside the electrodes at a high gas pressure. The power absorption efficiency between the electrodes was improved by increasing the gas pressure. In addition, the plasma was produced efficiently between the electrodes at low applied voltages.",

author = "Kohei Ogiwara and Weiting Chen and Kiichiro Uchino and Yoshinobu Kawai",

year = "2013",

month = "11",

day = "1",

doi = "10.7567/JJAP.52.11ND01",

language = "English",

volume = "52",

journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",

issn = "0021-4922",

publisher = "Institute of Physics",

number = "11 PART 2",

}

TY - JOUR

T1 - Simulation of effective production of very high frequency hydrogen plasma using a balanced power feeding method

AU - Ogiwara, Kohei

AU - Chen, Weiting

AU - Uchino, Kiichiro

AU - Kawai, Yoshinobu

PY - 2013/11/1

Y1 - 2013/11/1

N2 - The characteristics of a VHF hydrogen plasma produced by a balanced power feeding method were examined by using a two-dimensional Monte Carlo fluid hybrid model. The simulation results showed that the electron density is maximum at a certain pressure between the discharge electrodes and significantly decreases outside the electrodes at a high gas pressure. The power absorption efficiency between the electrodes was improved by increasing the gas pressure. In addition, the plasma was produced efficiently between the electrodes at low applied voltages.

AB - The characteristics of a VHF hydrogen plasma produced by a balanced power feeding method were examined by using a two-dimensional Monte Carlo fluid hybrid model. The simulation results showed that the electron density is maximum at a certain pressure between the discharge electrodes and significantly decreases outside the electrodes at a high gas pressure. The power absorption efficiency between the electrodes was improved by increasing the gas pressure. In addition, the plasma was produced efficiently between the electrodes at low applied voltages.

UR - http://www.scopus.com/inward/record.url?scp=84889020226&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84889020226&partnerID=8YFLogxK

U2 - 10.7567/JJAP.52.11ND01

DO - 10.7567/JJAP.52.11ND01

M3 - Article

AN - SCOPUS:84889020226

VL - 52

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 11 PART 2

M1 - 11ND01

ER -

Access to Document

10.7567/JJAP.52.11ND01