Simulation of spatial characteristics of very high frequency hydrogen plasma produced by a balanced power feeding

Kohei Ogiwara, Weiting Chen, Kiichiro Uchino, Yoshinobu Kawai

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6 Citations (Scopus)

Abstract

The effects of a balanced power feeding (BPF) method on a very high frequency hydrogen plasma produced with narrow-gap parallel plate electrodes are studied by 2-dimensional simulation. It was found that the electron density increases inside the electrodes and decreases outside the electrodes. The input power was effectively absorbed into the intermediate region of the electrodes. In addition, the electron density outside the electrodes decreased with increasing the gas pressure, and the electron density inside the electrodes peaked at a certain pressure. The property of the power absorption was improved and the electron temperature decreased for the higher gas pressure in the BPF model.

Original languageEnglish
Pages (from-to)132-136
Number of pages5
JournalThin Solid Films
Volume547
DOIs
Publication statusPublished - Nov 29 2013

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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