Simultaneous epitaxial growth of anatase and rutile TiO2 thin films by RF helicon magnetron sputtering

Lei Miao, Sakae Tanemura, Ping Jin, Kenji Kaneko, Asuka Terai, Nataliya Nabatova-Gabain

Research output: Contribution to journalArticle

35 Citations (Scopus)

Abstract

Epitaxial films of TiO2 with rutile structure on sapphire and anatase structure on SrTiO3 were simultaneously grown by RF helicon magnetron sputtering of a TiO2 target in Ar atmosphere. X-ray diffraction using θ-2θ scan and pole figure plots confirmed the epitaxial relationship, which were rutile (1 0 1)∥sapphire (1 1 0), (0 1 0)f∥(0 0 1)s, and anatase (0 0 1)∥SrTiO3(0 0 1), (1 0 0)f∥(1 0 0)s, where suffix f and s stand for the film and substrate, respectively. Moreover, observation by transmission electron microscopy identified the epitaxial film growth of single crystalline anatase and rutile structure with slight lattice distortion compared with bulk. The lattice constants of a and b, which were calculated from electron diffraction spots and lattice image in TEM of the films were contracted while that of c being expanded. According to the results of spectroscopic ellipsometry, the films show very high refractive indices (n) at the designated wavelength range in comparison with the past reports on TiO2 thin films. Although there are no bulk references in the anatase case, the values n of the rutile film are comparable to the bulk in the data-book. Such high refractive indices of the films indicate the compact texture of the epitaxial films fabricated by helicon sputtering.

Original languageEnglish
Pages (from-to)100-106
Number of pages7
JournalJournal of Crystal Growth
Volume254
Issue number1-2
DOIs
Publication statusPublished - Jun 1 2003

Fingerprint

Helicons
Epitaxial growth
anatase
rutile
Magnetron sputtering
Titanium dioxide
magnetron sputtering
Epitaxial films
Thin films
thin films
Sapphire
Refractive index
Aluminum Oxide
Transmission electron microscopy
Spectroscopic ellipsometry
Film growth
sapphire
Electron diffraction
Crystal lattices
Lattice constants

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

Cite this

Simultaneous epitaxial growth of anatase and rutile TiO2 thin films by RF helicon magnetron sputtering. / Miao, Lei; Tanemura, Sakae; Jin, Ping; Kaneko, Kenji; Terai, Asuka; Nabatova-Gabain, Nataliya.

In: Journal of Crystal Growth, Vol. 254, No. 1-2, 01.06.2003, p. 100-106.

Research output: Contribution to journalArticle

Miao, Lei ; Tanemura, Sakae ; Jin, Ping ; Kaneko, Kenji ; Terai, Asuka ; Nabatova-Gabain, Nataliya. / Simultaneous epitaxial growth of anatase and rutile TiO2 thin films by RF helicon magnetron sputtering. In: Journal of Crystal Growth. 2003 ; Vol. 254, No. 1-2. pp. 100-106.
@article{d8bd389055bc46d78c54e85a98236a1e,
title = "Simultaneous epitaxial growth of anatase and rutile TiO2 thin films by RF helicon magnetron sputtering",
abstract = "Epitaxial films of TiO2 with rutile structure on sapphire and anatase structure on SrTiO3 were simultaneously grown by RF helicon magnetron sputtering of a TiO2 target in Ar atmosphere. X-ray diffraction using θ-2θ scan and pole figure plots confirmed the epitaxial relationship, which were rutile (1 0 1)∥sapphire (1 1 0), (0 1 0)f∥(0 0 1)s, and anatase (0 0 1)∥SrTiO3(0 0 1), (1 0 0)f∥(1 0 0)s, where suffix f and s stand for the film and substrate, respectively. Moreover, observation by transmission electron microscopy identified the epitaxial film growth of single crystalline anatase and rutile structure with slight lattice distortion compared with bulk. The lattice constants of a and b, which were calculated from electron diffraction spots and lattice image in TEM of the films were contracted while that of c being expanded. According to the results of spectroscopic ellipsometry, the films show very high refractive indices (n) at the designated wavelength range in comparison with the past reports on TiO2 thin films. Although there are no bulk references in the anatase case, the values n of the rutile film are comparable to the bulk in the data-book. Such high refractive indices of the films indicate the compact texture of the epitaxial films fabricated by helicon sputtering.",
author = "Lei Miao and Sakae Tanemura and Ping Jin and Kenji Kaneko and Asuka Terai and Nataliya Nabatova-Gabain",
year = "2003",
month = "6",
day = "1",
doi = "10.1016/S0022-0248(03)01149-7",
language = "English",
volume = "254",
pages = "100--106",
journal = "Journal of Crystal Growth",
issn = "0022-0248",
publisher = "Elsevier",
number = "1-2",

}

TY - JOUR

T1 - Simultaneous epitaxial growth of anatase and rutile TiO2 thin films by RF helicon magnetron sputtering

AU - Miao, Lei

AU - Tanemura, Sakae

AU - Jin, Ping

AU - Kaneko, Kenji

AU - Terai, Asuka

AU - Nabatova-Gabain, Nataliya

PY - 2003/6/1

Y1 - 2003/6/1

N2 - Epitaxial films of TiO2 with rutile structure on sapphire and anatase structure on SrTiO3 were simultaneously grown by RF helicon magnetron sputtering of a TiO2 target in Ar atmosphere. X-ray diffraction using θ-2θ scan and pole figure plots confirmed the epitaxial relationship, which were rutile (1 0 1)∥sapphire (1 1 0), (0 1 0)f∥(0 0 1)s, and anatase (0 0 1)∥SrTiO3(0 0 1), (1 0 0)f∥(1 0 0)s, where suffix f and s stand for the film and substrate, respectively. Moreover, observation by transmission electron microscopy identified the epitaxial film growth of single crystalline anatase and rutile structure with slight lattice distortion compared with bulk. The lattice constants of a and b, which were calculated from electron diffraction spots and lattice image in TEM of the films were contracted while that of c being expanded. According to the results of spectroscopic ellipsometry, the films show very high refractive indices (n) at the designated wavelength range in comparison with the past reports on TiO2 thin films. Although there are no bulk references in the anatase case, the values n of the rutile film are comparable to the bulk in the data-book. Such high refractive indices of the films indicate the compact texture of the epitaxial films fabricated by helicon sputtering.

AB - Epitaxial films of TiO2 with rutile structure on sapphire and anatase structure on SrTiO3 were simultaneously grown by RF helicon magnetron sputtering of a TiO2 target in Ar atmosphere. X-ray diffraction using θ-2θ scan and pole figure plots confirmed the epitaxial relationship, which were rutile (1 0 1)∥sapphire (1 1 0), (0 1 0)f∥(0 0 1)s, and anatase (0 0 1)∥SrTiO3(0 0 1), (1 0 0)f∥(1 0 0)s, where suffix f and s stand for the film and substrate, respectively. Moreover, observation by transmission electron microscopy identified the epitaxial film growth of single crystalline anatase and rutile structure with slight lattice distortion compared with bulk. The lattice constants of a and b, which were calculated from electron diffraction spots and lattice image in TEM of the films were contracted while that of c being expanded. According to the results of spectroscopic ellipsometry, the films show very high refractive indices (n) at the designated wavelength range in comparison with the past reports on TiO2 thin films. Although there are no bulk references in the anatase case, the values n of the rutile film are comparable to the bulk in the data-book. Such high refractive indices of the films indicate the compact texture of the epitaxial films fabricated by helicon sputtering.

UR - http://www.scopus.com/inward/record.url?scp=0038285173&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0038285173&partnerID=8YFLogxK

U2 - 10.1016/S0022-0248(03)01149-7

DO - 10.1016/S0022-0248(03)01149-7

M3 - Article

VL - 254

SP - 100

EP - 106

JO - Journal of Crystal Growth

JF - Journal of Crystal Growth

SN - 0022-0248

IS - 1-2

ER -