Simultaneous in situ measurements of properties of particulates in rf silane plasmas using a polarization-sensitive laser-light-scattering method

Masaharu Shiratani, Hiroharu Kawasaki, Tsuyoshi Fukuzawa, Takashi Yoshioka, Yoshio Ueda, Sanjay Singh, Yukio Watanabe

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Abstract

This work has studied particulate growth process in silane rf discharges and found that they seem to grow rapidly even in a range of their size smaller than 40nm. To observe such rapid growth processes of particulates, a polarization-sensitive laser-light-scattering measurement system is developed, which has a good time resolution and a high sensitivity. Properties of particulates are derived from simultaneous measurements of three differently polarized components of light scattered by the particulates and are successfully determined in a range of size down to 10nm.

Original languageEnglish
Pages (from-to)104-109
Number of pages6
JournalJournal of Applied Physics
Volume79
Issue number1
DOIs
Publication statusPublished - Jan 1 1996

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All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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