Site-specific fabrication of polymer and metal ultrathin films onto the substrate with two-dimensionally controlled wetting properties by the ink-jet method

Shigekazu Yasutake, Masamichi Morita, Tomoyuki Koga, Susumu Sakio, Jun Fukai, Atsushi Takahara

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In this study, the fabrication of thin films with line width in 1-20 micrometer scale by the IJ method on patterned fluoroalkylsilane monolayer are studied utilizing intelligent wetting originated from wetting anisotropy. Line-patterned fluoroalkylsilane monolayer with lyophobic/lyophilic area (line width 1-20 μm) was prepared through vacuum ultra violet photolithography process. Lyophobic and lyophilic areas were terminated with silanol and fluoroalkyl groups, respectively. The thin films of polymer or metal were site-selectively formed on the micropatterned lyophilic areas. In the case of using the patterned organosilane monolayer with long alkyl-chains, unpatterned thin films were fabricated. Hence, large wetting contrast between lyophobic and lyophilic areas is necessary to fabricate the patterned thin films by the IJ method.

Original languageEnglish
Title of host publicationPolymer Preprints, Japan - 55th SPSJ Annual Meeting
Number of pages1
Volume55
Edition1
Publication statusPublished - Oct 18 2006
Event55th SPSJ Annual Meeting - Nagoya, Japan
Duration: May 24 2006May 26 2006

Other

Other55th SPSJ Annual Meeting
CountryJapan
CityNagoya
Period5/24/065/26/06

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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