Line-patterned fluoroalkylsilane monolayer with liquidphilic/liquidphobic area (line width 1-20 micro meter) was prepared through VUV photolithography process. Liquidphilic and liquidphobic areas were terminated with silanol groups and fluoroalkyl groups, respectively. Microscopic droplets of a xylene solution of polystyrene (PS) were deposited on the micropatterned surface by the ink-jet method. On this surface, a macroscopic droplet of polymer solution shows anisotropic wetting behavior. While the contact lines of liquidphobic surface move in drying process of solvent, the contact lines of liquidphilic surface are fixed. Therefore, the PS thin films were selectively formed on the micropatterned liquidphilic areas. Formation of line-patterned PS thin films was investigated by optical and scanning force microscopy.
|Number of pages||1|
|Publication status||Published - Dec 1 2005|
|Event||54th SPSJ Annual Meeting 2005 - Yokohama, Japan|
Duration: May 25 2005 → May 27 2005
|Other||54th SPSJ Annual Meeting 2005|
|Period||5/25/05 → 5/27/05|
All Science Journal Classification (ASJC) codes