Size and flux of carbon nanoparticles synthesized by Ar+CH4 multi-hollow plasma chemical vapor deposition

Sung Hwa Hwang, Takamasa Okumura, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

Carbon nanoparticles (CNPs) were synthesized using Ar + CH4 multi-hollow plasma chemical vapor deposition. The deposition flux of CNPs to a substrate was studied as a function of the plasma discharge time t and the distance L between the plasma and the substrate. CNPs were not deposited for L = 60 and 80 mm, whereas they were deposited for L = 100, 120 and 140 mm. The mean diameter of CNPs was 25 nm irrespective of L. For L = 120 and 140 mm, the flux gradually increased until t = 30 min and then became constant, indicating that thermophoretic force drives CNPs' deposition. Raman spectroscopy showed that a-C:H films were formed for L ≤ 80 mm, while polymer CNPs were predominant deposits for L ≥ 100 mm.

Original languageEnglish
Article number108050
JournalDiamond and Related Materials
Volume109
DOIs
Publication statusPublished - Nov 2020

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Materials Chemistry
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Size and flux of carbon nanoparticles synthesized by Ar+CH<sub>4</sub> multi-hollow plasma chemical vapor deposition'. Together they form a unique fingerprint.

Cite this