An alternative solution-based approach to fabricate high-κ metal oxide ultrathin films via a surface sol-gel process was established. Using this approach, ultrathin films were fabricated from conventional dielectric materials MO2 (M=Ti, Zr) as well as from binary oxide composites MO2-M′On (M′=Ta, La). These ultrathin films showed dielectric properties comparable to those obtained by vapor-deposition methods.
All Science Journal Classification (ASJC) codes
- Materials Science(all)
- Mechanics of Materials
- Mechanical Engineering