Special issue on basics and applications of plasma technology

Jong Shinn Wu; Kungen Tsutsui; Jinn P. Chu; Cheng Che Hsu

doi:10.1109/TPS.2013.2288852

Special issue on basics and applications of plasma technology

Jong Shinn Wu, Kungen Tsutsui, Jinn P. Chu, Cheng Che Hsu

Electrical Engineering Sciences

Research output: Contribution to journal › Editorial › peer-review

Original language	English
Article number	6657001
Pages (from-to)	3190-3191
Number of pages	2
Journal	IEEE Transactions on Plasma Science
Volume	41
Issue number	11
DOIs	https://doi.org/10.1109/TPS.2013.2288852
Publication status	Published - Nov 27 2013

All Science Journal Classification (ASJC) codes

Nuclear and High Energy Physics
Condensed Matter Physics

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10.1109/TPS.2013.2288852

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title = "Special issue on basics and applications of plasma technology",

author = "Wu, {Jong Shinn} and Kungen Tsutsui and Chu, {Jinn P.} and Hsu, {Cheng Che}",

year = "2013",

month = nov,

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doi = "10.1109/TPS.2013.2288852",

language = "English",

volume = "41",

pages = "3190--3191",

journal = "IEEE Transactions on Plasma Science",

issn = "0093-3813",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

number = "11",

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AU - Wu, Jong Shinn

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AU - Hsu, Cheng Che

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M3 - Editorial

AN - SCOPUS:84888098639

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EP - 3191

JO - IEEE Transactions on Plasma Science

JF - IEEE Transactions on Plasma Science

SN - 0093-3813

IS - 11

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Special issue on basics and applications of plasma technology

All Science Journal Classification (ASJC) codes

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