Special issue on basics and applications of plasma technology

Jong Shinn Wu; Kungen Teii; Jinn P. Chu; Cheng Che Hsu

doi:10.1109/TPS.2013.2280422

Special issue on basics and applications of plasma technology

Jong Shinn Wu, Kungen Teii, Jinn P. Chu, Cheng Che Hsu

Electrical Engineering Sciences

Research output: Contribution to journal › Editorial › peer-review

Original language	English
Article number	6594883
Pages (from-to)	2574-2575
Number of pages	2
Journal	IEEE Transactions on Plasma Science
Volume	41
Issue number	9
DOIs	https://doi.org/10.1109/TPS.2013.2280422
Publication status	Published - 2013

All Science Journal Classification (ASJC) codes

Nuclear and High Energy Physics
Condensed Matter Physics

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10.1109/TPS.2013.2280422

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@article{e4eda114f7f849508ab476bab068e20a,

title = "Special issue on basics and applications of plasma technology",

author = "Wu, {Jong Shinn} and Kungen Teii and Chu, {Jinn P.} and Hsu, {Cheng Che}",

year = "2013",

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language = "English",

volume = "41",

pages = "2574--2575",

journal = "IEEE Transactions on Plasma Science",

issn = "0093-3813",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

number = "9",

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AU - Hsu, Cheng Che

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M3 - Editorial

AN - SCOPUS:84884542131

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SP - 2574

EP - 2575

JO - IEEE Transactions on Plasma Science

JF - IEEE Transactions on Plasma Science

IS - 9

M1 - 6594883

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Special issue on basics and applications of plasma technology

All Science Journal Classification (ASJC) codes

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