Spectral dynamics analysis of ultra-line-narrowed F2 laser

Takahito Kumazaki, Osamu Wakabayashi, Ryoichi Nohdomi, Tatsuya Ariga, Hidenori Watanabe, Kazuaki Hotta, Hakaru Mizoguchi, Hiroki Tanaka, Akihiko Takahashi, Tatsuo Okada

Research output: Contribution to journalConference articlepeer-review


We have developed an ultra-line-narrowed, high-repetition-rate, high-power injection-locked F2 laser system for 157 nm dioptric projection systems under the ASET project "F2 Laser Lithography Development Project". A spectral bandwidth of <0.2 pm (FWHM), an output power of >25 W, and an energy stability (3-sigma) of <10 % at 5 kHz repetition rate was successfully obtained by using a low-power ultra-line-narrowed oscillator laser and a high-gain multi-pass amplifier laser. These parameters satisfy the requirements of exposure tools. A numerical simulation code that can simulate the spectral dynamics of the F2 laser under different operation modes such as free running operation, line-narrowed operation, and injection-locked operation, has also been developed. Using this simulation code, it is found that the instantaneous spectral bandwidth narrows monotonously during the laser pulse, and a narrower spectral output can be obtained by seeding the tail area of the line-narrowed F2laser pulse. And the line-narrowing operation of the oscillator laser and the behavior of the injection-locked laser system can be predicted very precisely with this simulation code. The development of F2 laser for microlithography will be accelerated by this new simulation code.

Original languageEnglish
Pages (from-to)1363-1370
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume5040 III
Publication statusPublished - 2003
EventOptical Microlithography XVI - Santa Clara, CA, United States
Duration: Feb 25 2003Feb 28 2003

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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