Sputtering deposition of Al-doped zinc oxide thin films using mixed powder targets

Tamiko Ohshima, Takashi Maeda, Yuki Tanaka, Hiroharu Kawasaki, Yoshihito Yagyu, Takeshi Ihara, Yoshiaki Suda

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5 Citations (Scopus)

Abstract

Sputtering deposition generally uses high-density bulk targets. Such a fabrication process has various problems including deterioration of the material during heating and difficulty in mixing a large number of materials in precise proportions. However, these problems can be solved by using a powder target. In this study, we prepared Al-doped ZnO (AZO) as transparent conductive thin films by radio-frequency magnetron sputtering with powder and bulk targets. Both the powder and bulk targets formed crystalline structures. The ZnO (002) peak was observed in the X-ray diffraction measurements. The mean transparency and resistivity of the films prepared with the powder target were 82% and 0.548Ωcm, respectively. The deposition rate with the powder target was lower than that with the bulk target.

Original languageEnglish
Article number01AA08
JournalJapanese journal of applied physics
Volume55
Issue number1
DOIs
Publication statusPublished - Jan 2016
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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