Stabilization of polystyrene thin films against dewetting by silsesquioxane-terminated polystyrene additives

Kyota Miyamoto, Nao Hosaka, Hideyuki Otsuka, Atsushi Takahara

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

A polyhedral oligomeric silsesquioxane (POSS)-containing initiator for nitroxide-mediated radical polymerization was synthesized to prepare organic-inorganic hybrid polymers (PS-POSS), which are polystyrene (PS) with a POSS end group. PS-POSS were well dispersed in PS thin films and provided thermal stability to films against dewetting.

Original languageEnglish
Pages (from-to)1098-1099
Number of pages2
JournalChemistry Letters
Volume35
Issue number10
DOIs
Publication statusPublished - Oct 5 2006

Fingerprint

Polystyrenes
Stabilization
Thin films
Free radical polymerization
Polymers
Thermodynamic stability

All Science Journal Classification (ASJC) codes

  • Chemistry(all)

Cite this

Stabilization of polystyrene thin films against dewetting by silsesquioxane-terminated polystyrene additives. / Miyamoto, Kyota; Hosaka, Nao; Otsuka, Hideyuki; Takahara, Atsushi.

In: Chemistry Letters, Vol. 35, No. 10, 05.10.2006, p. 1098-1099.

Research output: Contribution to journalArticle

Miyamoto, Kyota ; Hosaka, Nao ; Otsuka, Hideyuki ; Takahara, Atsushi. / Stabilization of polystyrene thin films against dewetting by silsesquioxane-terminated polystyrene additives. In: Chemistry Letters. 2006 ; Vol. 35, No. 10. pp. 1098-1099.
@article{9863e271cc3c4adeb6fd0bf20276105e,
title = "Stabilization of polystyrene thin films against dewetting by silsesquioxane-terminated polystyrene additives",
abstract = "A polyhedral oligomeric silsesquioxane (POSS)-containing initiator for nitroxide-mediated radical polymerization was synthesized to prepare organic-inorganic hybrid polymers (PS-POSS), which are polystyrene (PS) with a POSS end group. PS-POSS were well dispersed in PS thin films and provided thermal stability to films against dewetting.",
author = "Kyota Miyamoto and Nao Hosaka and Hideyuki Otsuka and Atsushi Takahara",
year = "2006",
month = "10",
day = "5",
doi = "10.1246/cl.2006.1098",
language = "English",
volume = "35",
pages = "1098--1099",
journal = "Chemistry Letters",
issn = "0366-7022",
publisher = "The Chemical Society of Japan",
number = "10",

}

TY - JOUR

T1 - Stabilization of polystyrene thin films against dewetting by silsesquioxane-terminated polystyrene additives

AU - Miyamoto, Kyota

AU - Hosaka, Nao

AU - Otsuka, Hideyuki

AU - Takahara, Atsushi

PY - 2006/10/5

Y1 - 2006/10/5

N2 - A polyhedral oligomeric silsesquioxane (POSS)-containing initiator for nitroxide-mediated radical polymerization was synthesized to prepare organic-inorganic hybrid polymers (PS-POSS), which are polystyrene (PS) with a POSS end group. PS-POSS were well dispersed in PS thin films and provided thermal stability to films against dewetting.

AB - A polyhedral oligomeric silsesquioxane (POSS)-containing initiator for nitroxide-mediated radical polymerization was synthesized to prepare organic-inorganic hybrid polymers (PS-POSS), which are polystyrene (PS) with a POSS end group. PS-POSS were well dispersed in PS thin films and provided thermal stability to films against dewetting.

UR - http://www.scopus.com/inward/record.url?scp=33846069339&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33846069339&partnerID=8YFLogxK

U2 - 10.1246/cl.2006.1098

DO - 10.1246/cl.2006.1098

M3 - Article

AN - SCOPUS:33846069339

VL - 35

SP - 1098

EP - 1099

JO - Chemistry Letters

JF - Chemistry Letters

SN - 0366-7022

IS - 10

ER -