Stabilization of polystyrene thin films against dewetting by silsesquioxane-terminated polystyrene additives

Kyota Miyamoto, Nao Hosaka, Hideyuki Otsuka, Atsushi Takahara

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

Abstract

A polyhedral oligomeric silsesquioxane (POSS)-containing initiator for nitroxide-mediated radical polymerization was synthesized to prepare organic-inorganic hybrid polymers (PS-POSS), which are polystyrene (PS) with a POSS end group. PS-POSS were well dispersed in PS thin films and provided thermal stability to films against dewetting.

Original languageEnglish
Pages (from-to)1098-1099
Number of pages2
JournalChemistry Letters
Volume35
Issue number10
DOIs
Publication statusPublished - Oct 5 2006

All Science Journal Classification (ASJC) codes

  • Chemistry(all)

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