Stable crystallization of a-Si film on a flexible substrate

T. Ashitomi, T. Harada, K. Nakao, C. J. Koswaththage, T. Okada, T. Noguchi, N. Kawamoto, Hiroshi Ikenoue, T. Okuyama, A. Suwa, K. Noda

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The ELA using high repetition pulse for a-Si film on flexible sheet is perfonned. As a result of multi-shots ELA, the crystal structure of Si film on oxide buffer layer was stably obtained in lower pulse energy density. High performance TFT on flexible sheet is expected.

Original languageEnglish
Title of host publication22nd International Display Workshops, IDW 2015
PublisherInternational Display Workshops
Pages1773-1774
Number of pages2
ISBN (Electronic)9781510845503
Publication statusPublished - Jan 1 2015
Event22nd International Display Workshops, IDW 2015 - Otsu, Japan
Duration: Dec 9 2015Dec 11 2015

Publication series

NameProceedings of the International Display Workshops
Volume3
ISSN (Print)1883-2490

Other

Other22nd International Display Workshops, IDW 2015
CountryJapan
CityOtsu
Period12/9/1512/11/15

All Science Journal Classification (ASJC) codes

  • Computer Vision and Pattern Recognition
  • Human-Computer Interaction
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Radiology Nuclear Medicine and imaging

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  • Cite this

    Ashitomi, T., Harada, T., Nakao, K., Koswaththage, C. J., Okada, T., Noguchi, T., Kawamoto, N., Ikenoue, H., Okuyama, T., Suwa, A., & Noda, K. (2015). Stable crystallization of a-Si film on a flexible substrate. In 22nd International Display Workshops, IDW 2015 (pp. 1773-1774). (Proceedings of the International Display Workshops; Vol. 3). International Display Workshops.