Stitching interferometric measurement system for hard X-ray nanofocusing mirrors

Hirokatsu Yumoto, Hidekazu Mimura, Soichiro Handa, Takashi Kimura, Satoshi Matsuyama, Yasuhisa Sano, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, Kazuto Yamauchi

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Abstract

We have developed an advanced type of relative angle determinable stitching interferometry (RADSI) for hard X-ray nanofocusing mirrors. The surface metrology system consists of two types of optical interferometers. One is a microscope Michelson interferometer, which measures the local figure profile of the mirror surface, and the other is a large-area Fizeau interferometer, which determines the stitching angles between neighboring shots using a flat mirror. The surface figure profile of each of the one-shots and the stitching angles are measured at the same time. Precise measurement of local surface area and the stitching angles of 1×10-8 rad order were achieved using the developed system. To demonstrate the accuracy of the developed measurement system, we measured an elliptically figured mirror for hard X-ray nanofocusing. The mirror's surface shape has a curvature radius of a few meters. As a result, measurement reproducibility and reliability of less than PV 3 nm was achieved by using a 25 nm focusing mirror.

Original languageEnglish
Article number012080
JournalJournal of Physics: Conference Series
Volume186
DOIs
Publication statusPublished - Dec 1 2009

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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    Yumoto, H., Mimura, H., Handa, S., Kimura, T., Matsuyama, S., Sano, Y., Yabashi, M., Nishino, Y., Tamasaku, K., Ishikawa, T., & Yamauchi, K. (2009). Stitching interferometric measurement system for hard X-ray nanofocusing mirrors. Journal of Physics: Conference Series, 186, [012080]. https://doi.org/10.1088/1742-6596/186/1/012080