Structure and photo-induced features of TiO2 thin films prepared by RF magnetron sputtering

Xiu Tian Zhao, Kenji Sakka, Naoto Kihara, Yasuyuki Takata, Makoto Arita, Masataka Masuda

Research output: Contribution to journalConference article

12 Citations (Scopus)

Abstract

TiO2 thin films were deposited on stainless steel substrates by radio frequency (RF) magnetron sputtering. The process conditions, including RF power, oxygen partial pressure, and temperature of substrate, were varied systematically. The deposited titanium dioxide films consisted of polycrystalline structure with the mixture of anatase and rutile. The average particle diameter of films changed from dozens of nanometers to hundreds of nanometers. It was found that the conditions, 200 W RF power, 90% oxygen partial pressure, and 673 K temperature of substrate, were optimal to deposit a TiO2 thin film with good photocatalytic activity and photo-induced hydrophilicity that will be attributable to their higher content of anatase.

Original languageEnglish
Pages (from-to)549-551
Number of pages3
JournalMicroelectronics Journal
Volume36
Issue number3-6
DOIs
Publication statusPublished - Mar 1 2005

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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