Structure and photo-induced features of TiO2 thin films prepared by RF magnetron sputtering

Xiu Tian Zhao; Kenji Sakka; Naoto Kihara; Yasuyuki Takata; Makoto Arita; Masataka Masuda

doi:10.1016/j.mejo.2005.02.094

Structure and photo-induced features of TiO₂ thin films prepared by RF magnetron sputtering

Xiu Tian Zhao, Kenji Sakka, Naoto Kihara, Yasuyuki Takata, Makoto Arita, Masataka Masuda

Thermal Engineering

Research output: Contribution to journal › Conference article › peer-review

13 Citations (Scopus)

Abstract

TiO₂ thin films were deposited on stainless steel substrates by radio frequency (RF) magnetron sputtering. The process conditions, including RF power, oxygen partial pressure, and temperature of substrate, were varied systematically. The deposited titanium dioxide films consisted of polycrystalline structure with the mixture of anatase and rutile. The average particle diameter of films changed from dozens of nanometers to hundreds of nanometers. It was found that the conditions, 200 W RF power, 90% oxygen partial pressure, and 673 K temperature of substrate, were optimal to deposit a TiO₂ thin film with good photocatalytic activity and photo-induced hydrophilicity that will be attributable to their higher content of anatase.

Original language	English
Pages (from-to)	549-551
Number of pages	3
Journal	Microelectronics Journal
Volume	36
Issue number	3-6
DOIs	https://doi.org/10.1016/j.mejo.2005.02.094
Publication status	Published - Mar 1 2005

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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10.1016/j.mejo.2005.02.094

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title = "Structure and photo-induced features of TiO2 thin films prepared by RF magnetron sputtering",

abstract = "TiO2 thin films were deposited on stainless steel substrates by radio frequency (RF) magnetron sputtering. The process conditions, including RF power, oxygen partial pressure, and temperature of substrate, were varied systematically. The deposited titanium dioxide films consisted of polycrystalline structure with the mixture of anatase and rutile. The average particle diameter of films changed from dozens of nanometers to hundreds of nanometers. It was found that the conditions, 200 W RF power, 90% oxygen partial pressure, and 673 K temperature of substrate, were optimal to deposit a TiO2 thin film with good photocatalytic activity and photo-induced hydrophilicity that will be attributable to their higher content of anatase.",

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T1 - Structure and photo-induced features of TiO2 thin films prepared by RF magnetron sputtering

AU - Zhao, Xiu Tian

AU - Sakka, Kenji

AU - Kihara, Naoto

AU - Takata, Yasuyuki

AU - Arita, Makoto

AU - Masuda, Masataka

PY - 2005/3/1

Y1 - 2005/3/1

N2 - TiO2 thin films were deposited on stainless steel substrates by radio frequency (RF) magnetron sputtering. The process conditions, including RF power, oxygen partial pressure, and temperature of substrate, were varied systematically. The deposited titanium dioxide films consisted of polycrystalline structure with the mixture of anatase and rutile. The average particle diameter of films changed from dozens of nanometers to hundreds of nanometers. It was found that the conditions, 200 W RF power, 90% oxygen partial pressure, and 673 K temperature of substrate, were optimal to deposit a TiO2 thin film with good photocatalytic activity and photo-induced hydrophilicity that will be attributable to their higher content of anatase.

AB - TiO2 thin films were deposited on stainless steel substrates by radio frequency (RF) magnetron sputtering. The process conditions, including RF power, oxygen partial pressure, and temperature of substrate, were varied systematically. The deposited titanium dioxide films consisted of polycrystalline structure with the mixture of anatase and rutile. The average particle diameter of films changed from dozens of nanometers to hundreds of nanometers. It was found that the conditions, 200 W RF power, 90% oxygen partial pressure, and 673 K temperature of substrate, were optimal to deposit a TiO2 thin film with good photocatalytic activity and photo-induced hydrophilicity that will be attributable to their higher content of anatase.

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JO - Microelectronics

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ER -

Structure and photo-induced features of TiO₂ thin films prepared by RF magnetron sputtering

Abstract

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