Study of growth kinetics and behaviour of particles in a heliumsilane rf plasma using laser diagnostic methods

Yukio Watanabe, Masaharu Shiratani, Masayuki Yamashita

Research output: Contribution to journalArticle

31 Citations (Scopus)

Abstract

Growth kinetics and behaviours of particles in a He-SiH plasma are observed using the rf modulation method together with two in situ laser diagnostic methods. Observation reveals that particles tend to be sustained around the plasma/sheath boundary near the rf electrode, their size and density being 60-180 nm and 103-103 cm-3, and larger particles exist in a higher electric field region near the rf electrode. The particle growth rate is explained by taking into account the contribution of radical ion and/or radical fluxes. The particle trapping around the sheath edge is explained by balance between the electrostatic force and the ion drag force. An effect of the viscous force on the. particles and a suppression mechanism for RF-modulated discharges are also discussed.

Original languageEnglish
Pages (from-to)35-39
Number of pages5
JournalPlasma Sources Science and Technology
Volume2
Issue number1
DOIs
Publication statusPublished - Jan 1 1993
Externally publishedYes

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laser plasmas
kinetics
plasma sheaths
electrodes
sheaths
drag
ions
trapping
retarding
electrostatics
modulation
electric fields
lasers

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics

Cite this

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AU - Shiratani, Masaharu

AU - Yamashita, Masayuki

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AB - Growth kinetics and behaviours of particles in a He-SiH plasma are observed using the rf modulation method together with two in situ laser diagnostic methods. Observation reveals that particles tend to be sustained around the plasma/sheath boundary near the rf electrode, their size and density being 60-180 nm and 103-103 cm-3, and larger particles exist in a higher electric field region near the rf electrode. The particle growth rate is explained by taking into account the contribution of radical ion and/or radical fluxes. The particle trapping around the sheath edge is explained by balance between the electrostatic force and the ion drag force. An effect of the viscous force on the. particles and a suppression mechanism for RF-modulated discharges are also discussed.

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