Study of Si kinetics in interfacial SiO2 scavenging in HfO2 gate stacks

Xiuyan Li, Takeaki Yajima, Tomonori Nishimura, Akira Toriumi

Research output: Contribution to journalArticlepeer-review

Abstract

In this study, what occurs at the SiO2/substrate interface and how Si atoms in SiO2 behave in interfacial SiO2 scavenging in a HfO2 gate stack have been investigated. Since the same scavenging occurs on both Si and SiC substrates, the SiC substrate is used to study the role of the substrate. The characterizations of the SiO2/SiC interface show no Si growth on the substrate and no consumption of the substrate in the SiO2 scavenging. Isotope tracing experiments for a HfO2/SiO2/Si stack further demonstrate that atomic Si is generated in scavenging and diffuses out through the HfO2 layer. On the basis of these findings, the reaction at the SiO2/substrate interface is thermodynamically discussed.

Original languageEnglish
Article number061304
JournalApplied Physics Express
Volume8
Issue number6
DOIs
Publication statusPublished - Jun 1 2015
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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