Study of spatial profiles of capacitively coupled VHF H2 plasma by simulation

Kuan Chen Chen, Kuo Feng Chiu, Kohei Ogiwara, Li Wen Su, Kiichiro Uchino, Yoshinobu Kawai

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1 Citation (Scopus)

Abstract

The spatial profiles of a VHF H2 plasma (60MHz) for different discharge gap distances were examined at pressures of 66.7 and 133.3 Pa by twodimensional simulations using the plasma hybrid code. The electron density had a peak profile, and the maximum density depended on both the discharge gap distance and the pressure. A high-electron-density plasma with a low-electron temperature of approximately 1 eV was predicted by simulation at discharge gap distances of 15 and 20 mm. The plasma potential profile was composed of a plateau at the center and sharp slopes at the two sides. The axial profiles of the H+, H2+, and H3+ densities were calculated for the discharge gap distances of 10, 15, and 20 mm. It was found that the dominant ion species was H3+ except near the discharge electrode and the H2+ density near the discharge electrode was not negligible compared with the H3+ density at 66.7 Pa.

Original languageEnglish
Article number01AC05
JournalJapanese journal of applied physics
Volume56
Issue number1
DOIs
Publication statusPublished - Jan 2017

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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