Study on kinetics of hydrogen dissolution and hydrogen solubility in oxides using imaging plate technique

Kenichi Hashizume, K. Ogata, M. Nishikawa, T. Tanabe, S. Abe, S. Akamaru, Y. Hatano

    Research output: Contribution to journalArticle

    9 Citations (Scopus)

    Abstract

    Using a tritium imaging plate technique, kinetics of tritium dissolution and its solubility in several oxides were examined. Mirror-polished single crystals of alumina, spinel and zirconia were used as specimens, which were exposed to 133 Pa of a tritium(T)-deuterium(D) gas mixture (T/(T + D) ∼ 0.17) at temperatures ranging from 673 to 973 K for 1-5 h. The T surface activity on the specimens increased with increasing temperature and exposure time, it almost saturated at 873 K and reached 2 × 105 Bq/cm2 (1 × 1014 T/cm2), and no clear difference appeared among the types of specimens. The T activity in the oxide bulk also increased with temperature, in which there was a trend for the oxides: spinel ≧ zirconia ≧ alumina. In the T dissolution process for all oxides, the concentration gradient due to its diffusion was not observed even for short exposure times: the T density was almost uniform over the specimens in transition states and increased with exposure time up to the saturated value. These experimental results suggested that the rate-controlling process of T dissolution in the temperature region should be not its diffusion in the oxides but dissociation of hydrogen molecules (T-D mixture in this case) into atoms, its adsorption on the surface and/or T penetration from the surface into the bulk.

    Original languageEnglish
    JournalJournal of Nuclear Materials
    Volume442
    Issue number1-3 SUPPL.1
    DOIs
    Publication statusPublished - Jun 17 2013

    Fingerprint

    Oxides
    Tritium
    Hydrogen
    dissolving
    Dissolution
    solubility
    Solubility
    Imaging techniques
    tritium
    Kinetics
    oxides
    Aluminum Oxide
    kinetics
    hydrogen
    Zirconia
    Alumina
    zirconium oxides
    spinel
    Temperature
    aluminum oxides

    All Science Journal Classification (ASJC) codes

    • Nuclear and High Energy Physics
    • Materials Science(all)
    • Nuclear Energy and Engineering

    Cite this

    Study on kinetics of hydrogen dissolution and hydrogen solubility in oxides using imaging plate technique. / Hashizume, Kenichi; Ogata, K.; Nishikawa, M.; Tanabe, T.; Abe, S.; Akamaru, S.; Hatano, Y.

    In: Journal of Nuclear Materials, Vol. 442, No. 1-3 SUPPL.1, 17.06.2013.

    Research output: Contribution to journalArticle

    Hashizume, Kenichi ; Ogata, K. ; Nishikawa, M. ; Tanabe, T. ; Abe, S. ; Akamaru, S. ; Hatano, Y. / Study on kinetics of hydrogen dissolution and hydrogen solubility in oxides using imaging plate technique. In: Journal of Nuclear Materials. 2013 ; Vol. 442, No. 1-3 SUPPL.1.
    @article{40696a9985264e09a8c37e8e2bcb64be,
    title = "Study on kinetics of hydrogen dissolution and hydrogen solubility in oxides using imaging plate technique",
    abstract = "Using a tritium imaging plate technique, kinetics of tritium dissolution and its solubility in several oxides were examined. Mirror-polished single crystals of alumina, spinel and zirconia were used as specimens, which were exposed to 133 Pa of a tritium(T)-deuterium(D) gas mixture (T/(T + D) ∼ 0.17) at temperatures ranging from 673 to 973 K for 1-5 h. The T surface activity on the specimens increased with increasing temperature and exposure time, it almost saturated at 873 K and reached 2 × 105 Bq/cm2 (1 × 1014 T/cm2), and no clear difference appeared among the types of specimens. The T activity in the oxide bulk also increased with temperature, in which there was a trend for the oxides: spinel ≧ zirconia ≧ alumina. In the T dissolution process for all oxides, the concentration gradient due to its diffusion was not observed even for short exposure times: the T density was almost uniform over the specimens in transition states and increased with exposure time up to the saturated value. These experimental results suggested that the rate-controlling process of T dissolution in the temperature region should be not its diffusion in the oxides but dissociation of hydrogen molecules (T-D mixture in this case) into atoms, its adsorption on the surface and/or T penetration from the surface into the bulk.",
    author = "Kenichi Hashizume and K. Ogata and M. Nishikawa and T. Tanabe and S. Abe and S. Akamaru and Y. Hatano",
    year = "2013",
    month = "6",
    day = "17",
    doi = "10.1016/j.jnucmat.2013.05.038",
    language = "English",
    volume = "442",
    journal = "Journal of Nuclear Materials",
    issn = "0022-3115",
    publisher = "Elsevier",
    number = "1-3 SUPPL.1",

    }

    TY - JOUR

    T1 - Study on kinetics of hydrogen dissolution and hydrogen solubility in oxides using imaging plate technique

    AU - Hashizume, Kenichi

    AU - Ogata, K.

    AU - Nishikawa, M.

    AU - Tanabe, T.

    AU - Abe, S.

    AU - Akamaru, S.

    AU - Hatano, Y.

    PY - 2013/6/17

    Y1 - 2013/6/17

    N2 - Using a tritium imaging plate technique, kinetics of tritium dissolution and its solubility in several oxides were examined. Mirror-polished single crystals of alumina, spinel and zirconia were used as specimens, which were exposed to 133 Pa of a tritium(T)-deuterium(D) gas mixture (T/(T + D) ∼ 0.17) at temperatures ranging from 673 to 973 K for 1-5 h. The T surface activity on the specimens increased with increasing temperature and exposure time, it almost saturated at 873 K and reached 2 × 105 Bq/cm2 (1 × 1014 T/cm2), and no clear difference appeared among the types of specimens. The T activity in the oxide bulk also increased with temperature, in which there was a trend for the oxides: spinel ≧ zirconia ≧ alumina. In the T dissolution process for all oxides, the concentration gradient due to its diffusion was not observed even for short exposure times: the T density was almost uniform over the specimens in transition states and increased with exposure time up to the saturated value. These experimental results suggested that the rate-controlling process of T dissolution in the temperature region should be not its diffusion in the oxides but dissociation of hydrogen molecules (T-D mixture in this case) into atoms, its adsorption on the surface and/or T penetration from the surface into the bulk.

    AB - Using a tritium imaging plate technique, kinetics of tritium dissolution and its solubility in several oxides were examined. Mirror-polished single crystals of alumina, spinel and zirconia were used as specimens, which were exposed to 133 Pa of a tritium(T)-deuterium(D) gas mixture (T/(T + D) ∼ 0.17) at temperatures ranging from 673 to 973 K for 1-5 h. The T surface activity on the specimens increased with increasing temperature and exposure time, it almost saturated at 873 K and reached 2 × 105 Bq/cm2 (1 × 1014 T/cm2), and no clear difference appeared among the types of specimens. The T activity in the oxide bulk also increased with temperature, in which there was a trend for the oxides: spinel ≧ zirconia ≧ alumina. In the T dissolution process for all oxides, the concentration gradient due to its diffusion was not observed even for short exposure times: the T density was almost uniform over the specimens in transition states and increased with exposure time up to the saturated value. These experimental results suggested that the rate-controlling process of T dissolution in the temperature region should be not its diffusion in the oxides but dissociation of hydrogen molecules (T-D mixture in this case) into atoms, its adsorption on the surface and/or T penetration from the surface into the bulk.

    UR - http://www.scopus.com/inward/record.url?scp=84884900536&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=84884900536&partnerID=8YFLogxK

    U2 - 10.1016/j.jnucmat.2013.05.038

    DO - 10.1016/j.jnucmat.2013.05.038

    M3 - Article

    VL - 442

    JO - Journal of Nuclear Materials

    JF - Journal of Nuclear Materials

    SN - 0022-3115

    IS - 1-3 SUPPL.1

    ER -