Study on the fabrication of paint-type Si quantum dot-sensitized solar cells

Hyunwoong Seo, Min Kyu Son, Hee Je Kim, Yuting Wang, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)

Abstract

Quantum dots (QDs) have attracted much attention with their quantum characteristics in the research field of photochemical solar cells. Si QD was introduced as one of alternatives to conventional QD materials. However, their large particles could not penetrate inside TiO2 layer. Therefore, this work proposed the paint-type Si QD-sensitized solar cell. Its heat durability was suitable for the fabrication of paint-type solar cell. Si QDs were fabricated by multihollow discharge plasma chemical vapor deposition and characterized. The paste type, sintering temperature, and Si ratio were controlled and analyzed for better performance. Finally, its performance was enhanced by ZnS surface modification and the whole process was much simplified without sensitizing process.

Original languageEnglish
Article number10MB07
JournalJapanese journal of applied physics
Volume52
Issue number10 PART2
DOIs
Publication statusPublished - 2013

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Study on the fabrication of paint-type Si quantum dot-sensitized solar cells'. Together they form a unique fingerprint.

Cite this