Study on the fabrication of paint-type Si quantum dot-sensitized solar cells

Hyunwoong Seo, Min Kyu Son, Hee Je Kim, Yuting Wang, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

Quantum dots (QDs) have attracted much attention with their quantum characteristics in the research field of photochemical solar cells. Si QD was introduced as one of alternatives to conventional QD materials. However, their large particles could not penetrate inside TiO2 layer. Therefore, this work proposed the paint-type Si QD-sensitized solar cell. Its heat durability was suitable for the fabrication of paint-type solar cell. Si QDs were fabricated by multihollow discharge plasma chemical vapor deposition and characterized. The paste type, sintering temperature, and Si ratio were controlled and analyzed for better performance. Finally, its performance was enhanced by ZnS surface modification and the whole process was much simplified without sensitizing process.

Original languageEnglish
Article number10MB07
JournalJapanese journal of applied physics
Volume52
Issue number10 PART2
DOIs
Publication statusPublished - Nov 11 2013

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paints
Paint
Semiconductor quantum dots
Solar cells
solar cells
quantum dots
Fabrication
fabrication
sensitizing
durability
plasma jets
Surface treatment
Chemical vapor deposition
sintering
Durability
Sintering
vapor deposition
Plasmas
heat
Temperature

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Study on the fabrication of paint-type Si quantum dot-sensitized solar cells. / Seo, Hyunwoong; Son, Min Kyu; Kim, Hee Je; Wang, Yuting; Uchida, Giichiro; Kamataki, Kunihiro; Itagaki, Naho; Koga, Kazunori; Shiratani, Masaharu.

In: Japanese journal of applied physics, Vol. 52, No. 10 PART2, 10MB07, 11.11.2013.

Research output: Contribution to journalArticle

@article{7d3fc3ae8514449eba940b05ad2f36f8,
title = "Study on the fabrication of paint-type Si quantum dot-sensitized solar cells",
abstract = "Quantum dots (QDs) have attracted much attention with their quantum characteristics in the research field of photochemical solar cells. Si QD was introduced as one of alternatives to conventional QD materials. However, their large particles could not penetrate inside TiO2 layer. Therefore, this work proposed the paint-type Si QD-sensitized solar cell. Its heat durability was suitable for the fabrication of paint-type solar cell. Si QDs were fabricated by multihollow discharge plasma chemical vapor deposition and characterized. The paste type, sintering temperature, and Si ratio were controlled and analyzed for better performance. Finally, its performance was enhanced by ZnS surface modification and the whole process was much simplified without sensitizing process.",
author = "Hyunwoong Seo and Son, {Min Kyu} and Kim, {Hee Je} and Yuting Wang and Giichiro Uchida and Kunihiro Kamataki and Naho Itagaki and Kazunori Koga and Masaharu Shiratani",
year = "2013",
month = "11",
day = "11",
doi = "10.7567/JJAP.52.10MB07",
language = "English",
volume = "52",
journal = "Japanese Journal of Applied Physics",
issn = "0021-4922",
number = "10 PART2",

}

TY - JOUR

T1 - Study on the fabrication of paint-type Si quantum dot-sensitized solar cells

AU - Seo, Hyunwoong

AU - Son, Min Kyu

AU - Kim, Hee Je

AU - Wang, Yuting

AU - Uchida, Giichiro

AU - Kamataki, Kunihiro

AU - Itagaki, Naho

AU - Koga, Kazunori

AU - Shiratani, Masaharu

PY - 2013/11/11

Y1 - 2013/11/11

N2 - Quantum dots (QDs) have attracted much attention with their quantum characteristics in the research field of photochemical solar cells. Si QD was introduced as one of alternatives to conventional QD materials. However, their large particles could not penetrate inside TiO2 layer. Therefore, this work proposed the paint-type Si QD-sensitized solar cell. Its heat durability was suitable for the fabrication of paint-type solar cell. Si QDs were fabricated by multihollow discharge plasma chemical vapor deposition and characterized. The paste type, sintering temperature, and Si ratio were controlled and analyzed for better performance. Finally, its performance was enhanced by ZnS surface modification and the whole process was much simplified without sensitizing process.

AB - Quantum dots (QDs) have attracted much attention with their quantum characteristics in the research field of photochemical solar cells. Si QD was introduced as one of alternatives to conventional QD materials. However, their large particles could not penetrate inside TiO2 layer. Therefore, this work proposed the paint-type Si QD-sensitized solar cell. Its heat durability was suitable for the fabrication of paint-type solar cell. Si QDs were fabricated by multihollow discharge plasma chemical vapor deposition and characterized. The paste type, sintering temperature, and Si ratio were controlled and analyzed for better performance. Finally, its performance was enhanced by ZnS surface modification and the whole process was much simplified without sensitizing process.

UR - http://www.scopus.com/inward/record.url?scp=84887072757&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84887072757&partnerID=8YFLogxK

U2 - 10.7567/JJAP.52.10MB07

DO - 10.7567/JJAP.52.10MB07

M3 - Article

AN - SCOPUS:84887072757

VL - 52

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

SN - 0021-4922

IS - 10 PART2

M1 - 10MB07

ER -