A stable submicron-wide electric conductive pattern consists of silver nanoparticles/polymer composite is established via photolithographic procedure, in which the introduction of furan-functionalized surface for the chemical anchoring of the pattern was a significant contrivance. Due to the strong anchoring between narrow-patterned film and the treated substrate, submicron-wide patterns stands up well against the development and annealing process. Approximately 180 nm-wide nanopattern has been achieved by the irradiation of 488 nm light. The width is well below the dimension of the incident light wavelength. Time dependence of the electric resistance of the composite thin film during annealing process has been measured at 200°C, and an optimum annealing time was found. The achieved volume resistivity after the optimum annealing was evaluated as ∼8 × 10-4 Ohm-cm that was determined by four-probe measurements.
All Science Journal Classification (ASJC) codes
- Materials Science(all)
- Condensed Matter Physics