Submicron-wide pattern of silver wire stabilized on functionalized substrates

Chang Dae Keum; Takashi Fukuda; Hiro Matsuda; Kaoru Tamada

doi:10.1080/15421400490506450

Submicron-wide pattern of silver wire stabilized on functionalized substrates

Chang Dae Keum, Takashi Fukuda, Hiro Matsuda, Kaoru Tamada

Research output: Contribution to journal › Article › peer-review

Abstract

A stable submicron-wide electric conductive pattern consists of silver nanoparticles/polymer composite is established via photolithographic procedure, in which the introduction of furan-functionalized surface for the chemical anchoring of the pattern was a significant contrivance. Due to the strong anchoring between narrow-patterned film and the treated substrate, submicron-wide patterns stands up well against the development and annealing process. Approximately 180 nm-wide nanopattern has been achieved by the irradiation of 488 nm light. The width is well below the dimension of the incident light wavelength. Time dependence of the electric resistance of the composite thin film during annealing process has been measured at 200°C, and an optimum annealing time was found. The achieved volume resistivity after the optimum annealing was evaluated as ∼8 × 10^-4 Ohm-cm that was determined by four-probe measurements.

Original language	English
Pages (from-to)	27-39
Number of pages	13
Journal	Molecular Crystals and Liquid Crystals
Volume	425
DOIs	https://doi.org/10.1080/15421400490506450
Publication status	Published - Dec 1 2004
Externally published	Yes

All Science Journal Classification (ASJC) codes

Chemistry(all)
Materials Science(all)
Condensed Matter Physics

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10.1080/15421400490506450

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title = "Submicron-wide pattern of silver wire stabilized on functionalized substrates",

abstract = "A stable submicron-wide electric conductive pattern consists of silver nanoparticles/polymer composite is established via photolithographic procedure, in which the introduction of furan-functionalized surface for the chemical anchoring of the pattern was a significant contrivance. Due to the strong anchoring between narrow-patterned film and the treated substrate, submicron-wide patterns stands up well against the development and annealing process. Approximately 180 nm-wide nanopattern has been achieved by the irradiation of 488 nm light. The width is well below the dimension of the incident light wavelength. Time dependence of the electric resistance of the composite thin film during annealing process has been measured at 200°C, and an optimum annealing time was found. The achieved volume resistivity after the optimum annealing was evaluated as ∼8 × 10-4 Ohm-cm that was determined by four-probe measurements.",

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T1 - Submicron-wide pattern of silver wire stabilized on functionalized substrates

AU - Keum, Chang Dae

AU - Fukuda, Takashi

AU - Matsuda, Hiro

AU - Tamada, Kaoru

PY - 2004/12/1

Y1 - 2004/12/1

N2 - A stable submicron-wide electric conductive pattern consists of silver nanoparticles/polymer composite is established via photolithographic procedure, in which the introduction of furan-functionalized surface for the chemical anchoring of the pattern was a significant contrivance. Due to the strong anchoring between narrow-patterned film and the treated substrate, submicron-wide patterns stands up well against the development and annealing process. Approximately 180 nm-wide nanopattern has been achieved by the irradiation of 488 nm light. The width is well below the dimension of the incident light wavelength. Time dependence of the electric resistance of the composite thin film during annealing process has been measured at 200°C, and an optimum annealing time was found. The achieved volume resistivity after the optimum annealing was evaluated as ∼8 × 10-4 Ohm-cm that was determined by four-probe measurements.

AB - A stable submicron-wide electric conductive pattern consists of silver nanoparticles/polymer composite is established via photolithographic procedure, in which the introduction of furan-functionalized surface for the chemical anchoring of the pattern was a significant contrivance. Due to the strong anchoring between narrow-patterned film and the treated substrate, submicron-wide patterns stands up well against the development and annealing process. Approximately 180 nm-wide nanopattern has been achieved by the irradiation of 488 nm light. The width is well below the dimension of the incident light wavelength. Time dependence of the electric resistance of the composite thin film during annealing process has been measured at 200°C, and an optimum annealing time was found. The achieved volume resistivity after the optimum annealing was evaluated as ∼8 × 10-4 Ohm-cm that was determined by four-probe measurements.

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Submicron-wide pattern of silver wire stabilized on functionalized substrates

Abstract

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